Used ASML PAS 2500 / 40 #9245669 for sale

ASML PAS 2500 / 40 is an advanced wafer stepper equipment developed for lithography processes such as photomask generation for microchip and wafer fabrication. The device is a step-and-repeat system which provides nanometer level exposure accuracy and uniform exposure coverage. The unit is designed for fast and accurate photomask fabrication and lithography processes. It can handle a maximum substrate size of 355mm x 455mm, with the current maximum overlay accuracy of 0.5um. ASML PAS 2500/40 is equipped with an ammonia monitor for continuous real-time monitoring of process gas conditions for optimized wafer production. The platform includes a number of advanced features such as a high-speed servo actuator, a 12-inch nanometer accuracy stage, and a state-of-the-art illumination machine. The illumination tool consists of a semi-conductor laser mounted on a high-precision linear stage and can be precisely adjusted for uniform, high-resolution and edge-sharp images. PAS 2500 / 40 is designed to work with multiple types of photomasks and wafers, including standard 6-inch and 8-inch wafers, 2D and 3D wafers with up to 5-layers, and thin silicon wafers. The device can be used in combination with a wide range of input, process and output optics, including by ArF, KrF, and I-Line. PAS 2500/40 incorporates a number of sophisticated robotics and automation features that help improve process yield and reduce changeovers and downtimes. These include automatic cassette unload, positioning and loading, andautomatic shutter control. A process-specific software control is also available. ASML PAS 2500 / 40 is capable of processing multiple wafers and photomasks in high-volume production environments. By providing a robust and reliable lithography platform, the asset helps ensure the highest levels of wafer quality and yield for a wide variety of wafer fabrication and lithography applications.