Used ASML PAS 2500 / 40 #9275403 for sale

ASML PAS 2500 / 40
Manufacturer
ASML
Model
PAS 2500 / 40
ID: 9275403
Wafer Size: 6"
Wafer stepper, 6".
ASML PAS 2500 / 40 is an advanced wafer stepper designed for photolithography and other patterning applications. The stepper is equipped with a 58-inch resolution lens that is capable of producing a variety of features with a width of 0.5 microns. It is capable of producing features on surfaces up to 16" in diameter and can be loaded with substrates such as semiconductor wafers, flat panel displays, and MEMS/NEMS devices. ASML PAS 2500/40 utilizes several advanced technologies to ensure that the photolithography process is precise and efficient. It features Dynamic Non-Linear Dispersive Aberration Correction (DCDAC), a unique optical process for automatically assessing and correcting distortions in the projected image. PAS 2500 / 40 is also the first stepper to incorporate Pulse Width Modulated (PWM) illumination, resulting in greater accuracy and light uniformity. The stepper also uses a patented ImprintPower wavelength control system to ensure a consistent exposure dose. PAS 2500/40 offers a compact and efficient design that is easy to operate. The stepper has a small physical footprint and can easily be operated by a single user. The stepper also features an automated alignment function that facilitates precision overlay alignment between layers and improves edge placement accuracy. The versatility of the alignment function also allows the user to perform various adjustments, such as focus, rotation, position, and magnification. ASML PAS 2500 / 40 also features an advanced self-aligning mask stage. This advanced technology ensures a precise mask alignment of up to 0.5 microns, while also reducing the possibility of defects due to the mask's misalignment. Ultimately, ASML PAS 2500/40 is an advanced and reliable stepper for producing high-precision photolithography patterns. The stepper is easily operated by a single user and comes with a variety of advanced technologies to ensure that each patterning process runs as efficiently and accurately as possible.
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