Used ASML PAS 2500 / 40 #9275932 for sale

ASML PAS 2500 / 40 is a deep UV projection lithography equipment designed for the advanced lithography needs of semiconductor manufacturing. It incorporates advanced deep UV projection optics, pattern generation and alignment systems, as well as a substrate stage to ensure precision and accuracy of the lithography process. The advanced deep UV projection optics system is based on lattice and monochromator designs and is capable of delivering a variety of image formats, resolutions, and magnifications ranging from 10:1 to 1000:1. The optics provide a 5nm half-field contrast, allowing the unit to meet most current lithography needs and process requirements. The machine's pattern generation and alignment systems incorporate multiple pattern sources such as precision masks, photoresist-filled barrels, and digital micromirror devices (DMD). These provide a wide range of pattern types and repeatability, as well as accuracy and stability. Additionally, ASML PAS 2500/40 provides the accuracy required to image patterns in the 8nm half-field contrast range. The tool also boasts a sophisticated substrate stage, which is equipped with servo controllers to enable higher accuracy and repeatability with the lowest possible jitter errors. It provides fast, accurate and repeatable x,y,θ motion of the substrate, while maintaining optimal precision and performance. PAS 2500 / 40 also supports a number of advanced applications, such as double patterning and defect inspection, as well as process qualification testing. Additionally, its user-friendly interface and dedicated control and metrology packages provide a wealth of features to facilitate the implementation of even the most advanced lithography processes. Overall, PAS 2500/40 is an advanced deep UV wafer stepper that offers highly precise and accurate performance for a variety of applications in semiconductor manufacturing. It combines a wide range of features and capabilities, from its advanced deep UV projection optics asset and pattern generation and alignment systems, to its sophisticated substrate stage and user-friendly interface, ensuring that the most complex lithography tasks can be completed quickly and efficiently.