Used ASML PAS 2500 / 40 #9277550 for sale
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ID: 9277550
Wafer Size: 6"
Wafer stepper, 6"
Reticle masking:
(4) Independent blades
Full field of travel
Alignment system:
Dual automatic through-the-lens
Diffraction grating marks
Reticle alignment system
Illumination system:
Elliptical mirror
Fly's eye integrator
Position control:
Three-axis HP laser interferometer system
1988 vintage.
ASML PAS 2500 / 40 is an advanced semiconductor lithography tool, perfect for high-volume manufacturing and large wafer processing. It utilizes advanced scanning technologies, including parallel scan and fixed-mask-delay scanning, to ensure precise and consistent prints with minimal edge distortions. At the heart of the 2500/40 is an advanced coherent imaging equipment featuring a 13.3 inch square field of view. This imaging system incorporates two angles of linear polarization, four scanning modes and a quadrant-division mode for enhanced resolution. This imaging unit delivers a maximum resolution of two-microns - perfect for large dies. ASML PAS 2500/40 is capable of producing up to 12 inspection sites per 6-inch wafer and up to 10 spots per second. It also features an autoscan option for scanning across multiple fields of view and wafers. This assures accurate inspection and imprinting of high-volume wafers. Compared to earlier models, the 2500/40 provides an improved depth of field and up to 4x faster exposure times. The stepper is equipped with an enhanced power supply, providing stable and accurate exposure doses. Two advanced sample-tracking systems allow precise sample alignment, reducing miss-prints and increasing overall yield. Furthermore, the 2500/40 can be integrated with a sophisticated control software for easy machine management and processing. In terms of integration and maintenance, PAS 2500 / 40 is quite user friendly. The stepper features a module tool which allows easy access to parts and components. The entire asset can be set-up, calibrated and operated in as little as 12 minutes. A comprehensive suite of diagnostics ensures performance stability and output reliability. All-in-all, PAS 2500/40 is a high-performance, high-volume lithography stepper designed for industrial manufacturing operations. It is equipped with a wide range of advanced technologies, such as a high-resolution imaging model, automated sample-tracking systems and advanced power supply. And with an intuitive control software and quick and easy installation, the 2500/40 is an ideal solution for any large-scale lithography needs.
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