Used ASML PAS 5000 / 50 #293620128 for sale
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ID: 293620128
Wafer Size: 6"
Vintage: 2005
Stepper, 6"
Chiller
Light source wavelength: 365 nm
Numerical aperture: 0.48
Resolution: 0.5 μm
Depth of focus: 1.2 μm
Maximum exposure area (X / Y): 16 mm / 20 mm
Exposure intensity: 553 mW/cm²
Uniformity of light intensity: 2.45%
Transfer rate: ≥120 mm/s
CD Uniformity (Max-Min): ≤0.10 µm
Stage flatness: -0.1 μm/cm
Engraving precision (X / Y): 88 nm / 62 nm
Engraving method
Mask plate size: 5009
Mask switching time: 32s (with alignment action)
Mask plate cassette: 2-SMIF box
(4) Wafer stages
Exposure platform
Electric cabinet
Transfer unit
PC
Power supply
Projection and expose lens
Focus system
Electronics cabinet:
Lamp power
VME
MIOS1
MIOS2
VRS
HP Rack
Control systems:
Valve
Sensor
Reducer
Wafer handling:
Send unit
Receive unit
per-alignment
levelling device
Dipod
Discharge
Reticle handling:
Library
Per-alignment
Barcode
UV Lighting system:
Lamp housing
Mirror
Lens
Filter
Shutter
Stage movement:
Stator
Linear motor
Laser interferometer and source
Alignment system
2005 vintage.
ASML PAS 5000 / 50 is a highly precise, automated wafer stepper designed for the advanced lithography processes used in semiconductor production. Its sensitive handling and high-resolution imaging of the electrode-engraving process achieves extremely precise microscopic images on the silicon wafer for complex 3D structures. ASML PAS 5000/50 features a 4k advanced imaging equipment that enables a precise resolution of 12 nanometers. Onboard optical positioning technology ascertains the wafer position with nanometer accuracy, enabling accurate results every time. It also has an integrated 'real-time feature' which allows measurements of structures at varying depths, thus reducing the number of iterations during critical stages of the lithography process. PAS 5000 / 50 also has high processing speed for efficient operation. Its advanced algorithm can reduce processing times by up to 30%, significantly speeding up the entire lithography process. At the same time, it is designed to guarantee constant accuracy no matter the run-time. PAS 5000/50 is designed to be extremely stable, and its air vibration suppression system eliminates air flow noise. Additionally, its wafer-transport unit is designed to handle wafers gently, thereby preventing any stress on delicate components within the wafer. Finally, the machine's user-friendly control program is designed to allow operators to conveniently control the device with minimal effort. In conclusion, ASML PAS 5000 / 50 is a highly efficient, automated wafer stepper with advanced imaging capabilities and precise resolution. Its high processing speed and stable design allows for fast, accurate results with minimal effort. By offering extremely precise lithography technology, this device is ideal for modern semiconductor production.
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