Used ASML PAS 5000 / 50 #9235094 for sale

ASML PAS 5000 / 50 is a dedicated and highly advanced piece of equipment that is used in the production of integrated circuits. It is an advanced stepper equipment designed to provide high-resolution patterning of wafers during the fabrication process. ASML PAS 5000/50 offers an impressive accuracy of 0.5 microns over a field of 25mm with a high throughput. The system consists of a lithography stage, a vacuum exposure chamber, and a highly precise stage with an integrated motion controller. The motion controller is responsible for coordinating the motion of the stage to ensure the highest accuracy for pattern placement and resolution. The exposure chamber provides a vacuum environment in which to perform exposure of the pattern onto the wafer surface. The lithography stage has automated loading, alignment, exposure, and unloading functions to facilitate efficient throughput. The main feature of PAS 5000 / 50 is its advanced exposure technology which utilizes high-power visible light sources and optics, along with liquid ion-resistant optics technology. This feature improves the resolution of the imaging process and allows the chip makers to use a wide range of photoresist recipes, allowing the fabrication of more complex patterns. PAS 5000/50's design allows users to easily integrate it into their existing systems and processes. It is designed to be tightly integrated with the users process control systems, allowing for automated calibration and wafer handling. The unit also offers process control features such as temperature management, exposure, and post-coating processes. ASML PAS 5000 / 50 offers a strong future for chip production because of its advanced features and technologies. This machine provides fast and accurate pattern placement and is efficient in through-put and production time. Its high accuracy and flexibility makes it an ideal choice for a variety of chip fabrication processes. This tool is a perfect addition to any chip makers processing line.