Used ASML PAS 5000 / 50 #9282384 for sale

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Manufacturer
ASML
Model
PAS 5000 / 50
ID: 9282384
Wafer Size: 3"-6"
Stepper, 3"-6" Reticle, 5" PEP 2 (Color graphics) PEP 1/3/4 Chuckspot detection Wafer Tilt Monitor (WTM) Alignment Focus Offset (AFO) Stage Grid Verification (SGC) Multiple Image per Layer (MIL) Flexible Mark Position (FMP) Pre-alignment microscope position, 3".
ASML PAS 5000 / 50 is a wafer stepper designed to enable precise lithographic patterning of advanced semiconductor devices. It offers several features that enable it to create high-quality, high-resolution patterns at throughput rates that are often faster than competing steppers on the market. ASML PAS 5000/50 has a patented optics design that uses a combination of five-micron step resolution and telecentric optics. This design allows for very precise lithography with very low process variation due to consistent step accuracy. The stepper also has a 1000 watt Xenon lamp that is adjustable to vary the energy of the exposure beam to produce fine details or higher throughput. This helps to reduce the exposure time for high-resolution processes which increases throughput. The stepper uses a compact format stage which can be used to modify the shape of the exposure image. This allows for greater design flexibility and shorter exposure times. It also helps to ensure repeatable accuracy and high-performance exposures. PAS 5000 / 50 has an automated alignment system that utilizes dual video detection systems. This allows for quick, accurate alignment of small exposure areas, which ensures fast exposure times and reduces rejects. The stepper also has a high-accuracy positioning system that provides additional accuracy even in the high-throughput production environments. This helps to reduce exposure and motion times, allowing for higher throughput. The device also offers a large buffer size which ensures a high degree of exposure patterns without having to increase cycle times. The buffer size is also adjustable, which allows for flexibility and productivity depending on the desired result. Lastly, PAS 5000/50 has a total of five independently controlled process stages. This highly configurable system allows for high throughput and accuracy when performing complex multi-step processes. In summary, ASML PAS 5000 / 50 wafer stepper offers advanced optics and exposure technology that gives users the potential for higher resolution, more speed, and more flexibility when creating patterns. This makes ASML PAS 5000/50 a top-of-the-line wafer stepper for production semiconductor fabrication.
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