Used ASML PAS 5000 / 55 #9300741 for sale

ASML PAS 5000 / 55 is a highly precise wafer stepper which is used to produce wafer based microelectronic circuits. This machine is capable of masking substrata with high accuracy in a wide range of micro-fabrication technologies. It features an advanced lithography equipment that utilizes extreme UV (EUV) light from a plasma discharge to expose patterned light on a wafer. PAS 5000 / 55 provides excellent pattern resolution with little to no distortion, making it capable of producing very small structures with high yields. The lithography system utilizes mirror optics to project the EUV light onto a reticle which is mounted in the stepper. The machine scans the reticle at frequencies up to 30 kHz in order to produce an exact pattern over the wafer. The optical components of the unit have an extremely high numerical aperture of 0.9 to ensure the highest pattern resolution. The processor control accepts inputs from outside such as positional data from a pre-aligner, speed and acceleration data, and reticle data such as the number of repetitions per shot, width of pattern lines, and X-ray settings. The stepper is programmed with software to control the laser power, dose rate, and number of shots. The laser is capable of a pulse repetition rate of up to 4 MHz and a field size of up to 200 mm in diameter. The stepper is also capable of high exposure speeds of up to 20 m/sec, allowing for higher throughputs. ASML PAS 5000 / 55 has a number of safety features and sensors to ensure the safety of the operator and the machine. The machine is capable of functioning in a number of different environmental conditions. This includes features such as temperature, humidity, and vibration sensors to alert operators of any potential contamination. PAS 5000 / 55 is an excellent choice for chip production. It is reliable, accurate, and capable of producing complex structures efficiently. Furthermore, it is cost effective and provides excellent pattern resolution with minimal distortion, allowing for higher yields with fewer re-fabrication cycles.