Used ASML PAS 5500 / 100 #9045059 for sale

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Manufacturer
ASML
Model
PAS 5500 / 100
ID: 9045059
i-Line stepper Running noncritical layers Under OEM Service contract Currently installed 1994 vintage.
ASML PAS 5500 / 100 is an advanced wafer stepper designed for the semiconductor industry. This machine is capable of scanning the surface of multiple wafers at once in order to create a precise image. The scanning process is accurate and repeatable, enabling the machine to quickly fabricate tiny device structures with minimal defects. This equipment is equipped with motor-driven x- and y-axes that serve to position the wafer chuck. It also has an object lens that is capable of z-axis scanning, allowing it to scan a full wafer even on top of the wafer's uneven surface. The machine's scan size reaches up to 7.8 mm or 200 μm, giving it the capability to process large substrates, as well as very small devices. Impressively, ASML PAS 5500/100 is equipped with a 25mW ArF laser source which operates at a wavelength of 193nm. This laser combines the power of both deep ultraviolet exposure and a high-speed z-axis scanning process to offer rapid, precise development. Plus, it can process and image wafers with complex patterns with ease - even using thin lines and short-spacing. This system is built with a special exposure sensor and interface software designed to detect the second order aberrations of the optical unit. This ensures that the machine still operates with high accuracy despite the substrate's weak vibrations, so erratic patterns are avoided. Moreover, each step of the exposure process is monitored in real-time, so you can continue with the development even after a potential damage occurs. For keeping track of the development, the machine's control panel is fully interactive. You can view the status of the wafers and the scan data directly from the panel, which is even equipped with a jog wheel for altering the light source. In summary, PAS 5500 / 100 is a highly reliable wafer stepper capable of producing highly accurate and precise images. It features a 25mW ArF laser source and an exposure monitoring machine for tight control and precision, and it comes with an interactive control panel for easy tracking. All in all, it is the perfect machine for achieving the best process results.
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