Used ASML PAS 5500 / 100C #293817877 for sale

ASML PAS 5500 / 100C
Manufacturer
ASML
Model
PAS 5500 / 100C
ID: 293817877
Stepper Numerical Aperture (NA): 0.48-0.60 Resolution: 400 nm DCO:  70 Throughput (WPH): 74.
ASML PAS 5500 / 100C is a wafer stepper, or photolithographic machine, designed for use in the production of semiconductor chips. Its features and capabilities make it an ideal solution for a variety of advanced processing and fabrication needs. ASML PAS5500 / 100C is a step-and-scan equipment that provides superior precision and accuracy for both exposure and alignment, allowing for high-complexity products to be produced quickly and with a high degree of repeatability. The system is equipped with a custom-designed lens that can reach speeds up to three meters per second and is able to focus down to a resolution of 12 nanometers. In addition, the unit is capable of exposure doses up to 40 millijoules with a maximum field size of 300 millimeters. PAS 5500 / 100C can be operated in single module mode or as a fully automated machine. The single-module mode allows for precise control of the entire process and gives the user the ability to quickly make modifications and adjustments when necessary. The automated tool can be programmed to run single exposures or multiple exposures based on the design of the desired product. PAS5500 / 100C is equipped with a multichannel vision asset and a unique dual-gantry structure that is capable of image recognition and digital alignment. This ensures that the model is able to accurately align each layer of the product to be produced, resulting in a high degree of repeatability and a fast, reliable batch processing. In order to take advantage of the capabilities of ASML PAS 5500 / 100C, the equipment can be configured with a range of options including ASML FTH Front-end tool, which provides for an interface between ASML PAS5500 / 100C and the back-end tools, as well as advanced software packages for data analysis, monitoring, and control. PAS 5500 / 100C is a highly sophisticated system designed to provide for precise and reliable production results. With its advanced capabilities and custom-designed lenses, it is ideal for a range of advanced semiconductor fabrication needs.
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