Used ASML PAS 5500 / 100C #293822312 for sale
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ID: 293822312
Wafer Size: 6"
Vintage: 1995
Stepper, 6"
Air control unit
TCU controller
TCU power supply
Stainless steel reticle cassette rack
Control computer
Calibration wafer
TEAL 3/78U400 power conditioner
1995 vintage.
ASML PAS 5500 / 100C is a wafer stepper machine, capable of high precision photolithography and imaging processes. It is a step and repeat pattern manufacturing equipment designed for the production of semiconductors, optoelectronic devices, and other imaging materials. This system uses an extremely accurate stage to move a wafer under a fixed set of lens elements which project a pattern onto the wafer. The pattern is typically defined by a computer program. ASML PAS5500 / 100C is a wafer stepper with an advanced optics unit. It incorporates two high numerical aperture lenses with a total of eight lenses. The first lens functions as a field lens while the other seven lenses act as imaging lenses. The imaging objectives are comprised of seven DLAP (Diffractive Laser Advanced Patterning) aspheric lenses that enable the machine to achieve superior exactness and a minimum spot size of one micron. PAS 5500 / 100C features a computer numerical control (CNC) that enables the machine to accurately repeat patterns on the wafer surface. The tool also has two motorized stages, allowing for movement in the x, y, and z axes. The CNC is equipped with a multi-axis motion controller and a high precision feedback control asset for greater accuracy and repeatability. PAS5500 / 100C comes with a library of predefined patterns that allow for quick and easy processing of various materials. It also has an image processing software that allows for complete customization of images based on user supplied data. The software also enables the model to store and recall previous jobs, providing faster processing of orders. ASML PAS 5500 / 100C is capable of producing patterns ranging in size from one micron to over 750 microns. Its high resolution capability delivers the highest aspect ratios possible, allowing for precise and accurate imaging. The accuracy of this equipment is further enhanced by its proprietary alignment software. This software automatically aligns the reticles onto the wafer for maximum efficiency. ASML PAS5500 / 100C is an advanced imaging system that gives maximum precision and highest quality imaging potential. It is a compact and reliable unit that offers quick, cost effective production. The machine is highly scalable, making it perfect for large volume production and a wide range of applications. The machine also provides the highest resolution and precision, perfect for the most challenging applications.
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