Used ASML PAS 5500 / 100C #9228851 for sale
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ID: 9228851
Stepper
Uniformity: %
22x22 mm: </= 1.6
14.7*27.4mm: </= 1.6
Intensity: >/= 850 mW/cm^2
Lamp Life: 1500W: </= 150 hrs
Dose repeatability & accuracy: </= 1
Reticle masking black border size: </= 475
Image performance:
Astigmatism: </= 0.35
Focal plane deviation: </= 0.45
UDOF @ 0.40 um lines: >/= 1um
Focus / Leveling:
Focus repeatability focus: </= 50nm
Rx: </= 3 urad
Ry: </= 3 urad
FOCAL: Valid positions ≧ 14
Best focus < ± 0.2 um
Image tilt Rx < ± 5 urad
Image tilt Ry < ± 5 urad
Image distortion (lens):
Max X (NCE): </= 60nm
Max Y (NCE): </= 60nm
Magnification: </= 2 ppm
Rotation: </= 2 urad
Symmetrical T: </= 10 nm/cm2
Trapezoidal: </= 10 nm/cm2
Overlay performance:
Stage repeatability
Max x: </= 15nm
Max y: </= 15nm
Single machine: </= 60nm
2-NA Global overlay:
NA=0.48
NA=0.57
Prealigner accuracy:
Edge sensor
X (3sig): </= 8.5um
Y (3sig): </= 8.5um
Rotation (3sig): </= 180 urad
Edge sensor:
SD Y < ± 2.1 um
SD Rot < 45 urad
SD X < ± 2.1 um
Mark sensor:
SD Y < ± 2.1 um
SD Rot < 45 urad
SD X < ± 2.1 um
Image quality control (3sig):
Focus: </= 50 nm
Image Rx: </= 2 urad
Image Ry: </= 2 urad
Translation: </= 20 nm
Magnification: </= 2 ppm
Rotation: </= 2 urad
Throughput
(70) Shots at 200 mJ, 8": >/= (70) Wafers / Hour
Reticle exchange time: </= 29 Seconds
System reliability: > 500 PCs
Particle: 0.2um < 10ea
Laser output:
Alignment laser: > 12 mw
Interferometer HP laser: > 220 μw
Missing parts:
MVR Rack power supply
Lens bag inactivity
Workstation hard disk
(2) ACU Air pipes
Wafer handler elevator: 3/4 Cover.
ASML PAS 5500 / 100C is a wafer stepper used primarily for projecting masks onto a range of substrates. It is widely used in industries such as semiconductor manufacturing, solar, and flat panel displays. It boasts a range of features designed to maximize throughput while minimizing noise and other adverse factors; for example, the equipment offers a repositioning time of under 0.9 seconds, ensuring fast turnaround times for jobs. This system also contains environmental sensors that support intelligent monitoring of the ambient atmosphere, allowing for response and control in temperature, static and humidity. The unit is compatible with a range of optics and light sources, including ArF laser sources, deep UV light sources, and more, ensuring that jobs of all sizes and complexity can be completed. It also contains specialized features required for tasks such as OPC processing and stitch printing. Its modular design allows users to freely swap out and configure their equipment according to their needs, ensuring maximum efficiency. The machine is designed with advanced robotics to minimize vibrations, both vertically and horizontally, ensuring precise patterns and high-quality images. Its highly efficient cooling tool ensures particles heat is evenly distributed throughout the chamber during processing for uniform surface quality. Additionally, its advanced laser scatterometer asset is designed to provide a high degree of accuracy, ensuring that images are consistently aligned to sub-micron levels. ASML PAS5500 / 100C features ultra-fast motion control, capable of operating at frequencies of up to 2kHz. It's highly responsive design ensures fast response times to react to control commands from the operator for immediate adjustments. The model also contains a comprehensive library of profiles and a range of other features for total control over the imaging process. Additionally, it is designed with many safety features, such as power-down shutdown safety, lifted objects detection, and stage collision detection. This wafer stepper is designed for maximum versatility, boasting a range of features which make it suitable for a variety of applications. Its range of features makes it highly reliable and efficient, a key factor in its popularity among silicon device manufacturers.
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