Used ASML PAS 5500 / 100D #9045382 for sale

ASML PAS 5500 / 100D is a highly advanced piece of wafer stepper production equipment. This highly precise machine is used to etch intricate patterns onto the surface of microchip wafers. It uses an extremely accurate mirrored optics equipment to propagate a beam of light to etch patterns onto substrates. This device is considered to be the "workhorse" of production facilities due to its consistent accuracy and production rates. The heart of ASML PAS 5500/100D is its scanner which contains a curved mirror housing four arc-shaped mirrors. These mirrors are known as "facet mirrors" and allow the optical system to scan complex patterns from a single point source. The optical unit can scan both horizontally and vertically and can move at a rate of 375mm/sec. The optics machine is also temperature-controlled which ensures accurate and precise pattern replication. PAS 5500 / 100 D is designed to interact with its own software which allows the user to control the machine in three ways. The first is a real-time mode where an operator can select and set both general and specific variables such as exposure time, energy, and pattern complexity. The second is a "bulk" mode which allows the user to process a number of wafers at one time, while the third is a "batch" mode which enables the user to process multiple jobs simultaneously. PAS 5500/100D features an in-line metrology tool which allows the user to check the accuracy of their etched patterns. This asset uses the same optical model as the etching process to image the patterns on the material and determine any variances if found. Other features of PAS 5500 / 100D also include vacuum wafer handling systems, an LED source, high voltage power supplies, and high-density tape-automated bonding equipment which enables the production of modern wafers with extremely fine lines and small features. In summary, ASML PAS 5500 / 100 D is an extremely advanced and precise wafer stepper machine that is used in the production of microchip wafers. Its sophisticated, temperature-regulated optical equipment allows it to scan complex patterns from a single point with an extremely high degree of accuracy. It also utilizes a number of in-line metrology systems to double check the accuracy of etched patterns and vacuum wafer handling systems for added efficiency. With its robust and reliable design, ASML PAS 5500 / 100D is an invaluable tool in any wafer production facility.