Used ASML PAS 5500 / 100D #9075820 for sale
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ID: 9075820
Wafer Size: 8"
Vintage: 1996
Stepper, 8"
HDD
Intensity data: 245 mW/cm2
Uniformity: 2.71% (2014.2.27)
Dose accuracy: 0.37 %
Repeatability: 0.37 % (2014.2.27)
Single machine overlay:
X: 21 nm
Y: 23 nm (2005.12.23)
Wafer stage accuracy:
X: 5 nm
Y: 10 nm (2005.12.23)
Wafer stage repeatability:
X: 4 nm
Y: 8 nm (2005.12.23)
1996 vintage.
ASML PAS 5500 / 100D is a state-of-the-art step and repeat wafer stepper designed for production in semiconductor, photonics, and microelectronics fabrication. This equipment boasts an effective fielding area of 8-inch diameter wafers, allowing for the consistent production on even the smallest electronic components. ASML PAS 5500/100D employs advanced 0.6 and 0.75 micron upgrades, enabling an industry-leading resolution and a 5x reduction in overlay error. This reliable stepper features state of the art precision movement components, including a unique bottom containment closed loop architecture to help ensure accuracy and repeatability. PAS 5500 / 100 D also includes a proprietary sensor assembly composed of a digital inertia (DI) sensor, tilt corrected velocity sensor (TCV), and XY-speed sensors to allow for precise and automated control of its processes. ASML PAS 5500 / 100 D uses an advanced helium-neon (HeNe) laser system. It allows for completely automated wafer to reticle pattern registration as well as precise pattern exposure. The HeNe laser unit is efficient and adaptable to the needs of each individual user, allowing users to adjust the laser exposure dose, scan speed, laser intensity and scan area to the desired specifications. This machine also includes software upgrades to further enhance its user experience. The image processing algorithms precisely define registration marks and accurately locate unique features with unprecedented precision. The software is also equipped with powerful automation tools designed to improve cycle time and prevent coating errors. The patented AX+ series stepper, which incorporates PAS 5500 / 100D, employs advanced overlay and image distortion correction mechanisms. This patented technology ensures that exposure onto the wafer is consistent and accurate. PAS 5500/100D is the perfect stepper for high-volume production in the semiconductor, photonics, and microelectronics industries. Thanks to its HeNe laser tool, patented technologies, and powerful software, this asset produces results with unparalleled accuracy and repeatability.
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