Used ASML PAS 5500 / 100D #9212923 for sale
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ID: 9212923
Wafer Size: 8"
Vintage: 1996
Stepper, 8"
Illumination:
Uniformity:
22.0 x 22.0mm [%]: ≤1.5
14.7 x 27.4mm [%]: ≤1.5
Intensity: 900 mw/cm2
Dose repeatability and accuracy [%]: ≤1.0
Dose matching [%]: ≤2.0
Imaging:
UDOF (0.4nm) [um]: ≤1-0
Overlay:
Global overlay: 99.7% of all errors
Day 1 [nm]: X<60, Y<60
Day 2 [nm]: X<60, Y<60
Day 3 [nm]: X<60, Y<60
Stage accuracy [um]: X<15, Y<15
Material handling:
Prealign accuracy X pos [3Σ][um]: ≤8.5
Prealign accuracy Y pos [3Σ][um]: ≤8.5
Prealign accuracy Φ pos [3Σ][urad]: ≤180
Distortion:
Lens distortion [nm]: X ≤ 60, Y ≤ 60
Magnification [ppm]: ≤ 2.0
Die rotation [urad]: ≤ 2.0
Symmetrical [nm/cm2]: X≤ 10
Trapezoidal [mn/cm2]: Y≤ 10
1996 vintage.
ASML PAS 5500 / 100D is a deep-UV lithography stepper designed for semiconductor fabrication. The stepper is capable of producing features as small as 70 nanometers (nm) on advanced node electronics. The equipment has a wide range of customization options and is capable of handling up to five wafers per hour. The stepper is built on an XYZ stage platform and uses a long-arc lamp source to project a series of patterns onto the wafer. The platform utilizes a segmented wafer track to increase productivity, allowing the use of multiple, independent wafers at the same time. The computer-controlled optical assembly projects multiple images which are aligned with each other and converted into a 'master', composite pattern. The stepper uses a state-of-the-art stage calibration system and a guaranteed level 2 (extended) qualification wafer. The real-time wafer position monitoring (RPM) feature helps maintain alignment and accuracy on processing projects using both the scanner software and hardware components. The stepper also features an integrated operating unit, the Eclipse OS, for optimal performance and user control. The machine has a wide range of features and flexibility, which can be tailored for specific applications. This includes software for dose management, image-based metrology, process optimization and automated wafer handling. It can also be programmed for local and remote data monitoring, analysis and tracking. ASML PAS 5500/100D is designed to meet the demands of advanced process lithography. Its compact size, superior performance, and customizable options make it ideal for many chip production and advanced semiconductor processes. It combines precision, stability and affordability, and is the perfect tool for many foundry and chip designer applications.
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