Used ASML PAS 5500 / 100D #9228177 for sale
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ID: 9228177
Wafer Size: 8"
Vintage: 1996
Stepper, 8"
Illumination:
Uniformity:
22.0 x 22.0mm [%]: ≤1.5
14.7 x 27.4mm [%]: ≤1.5
Intensity: 900 mw/cm2
Dose repeatability & accuracy [%]: ≤1.0
Dose matching [%]: ≤2.0
Imaging:
UDOF (0.4nm) [um]: ≤1-0
Overlay:
Global overlay: 99.7% (All errors)
Day 1 [nm]: X<60, Y<60
Day 2 [nm]: X<60, Y<60
Day 3 [nm]: X<60, Y<60
Stage accuracy [um]: X<15, Y<15
Material handling:
Prealign accuracy X pos [3Σ][um]: ≤8.5
Prealign accuracy Y pos [3Σ][um]: ≤8.5
Prealign accuracy Φ pos [3Σ][urad]: ≤180
Distortion:
Lens distortion [nm]: X ≤ 60, Y ≤ 60
Magnification [ppm]: ≤ 2.0
Die rotation [urad]: ≤ 2.0
Symmetrical [nm/cm2]: X≤ 10
Trapezoidal [mn/cm2]: Y≤ 10
1996 vintage.
ASML PAS 5500 / 100D is one of the most advanced and reliable wafer steppers for photolithography applications on the market today. This stepper is capable of delivering world-class process performance over a full range of feature sizes. ASML PAS 5500/100D features a modular design allowing for maximum flexibility and upgradability. It is built with an advanced optical equipment that is designed for high-end precision alignment and exposure. This system is designed for both amplitude and phase modulation of the exposure light, providing excellent spatial resolution and highest dynamic range. PAS 5500 / 100 D also features a fully automated aligner and overlay platform that provides rapid real-time overlay measurement and verification in the process. This platform allows the user to monitor and control the full mask processing across the wafer. The improved linear motors and drives enable smooth, accurate and repeatable motion. The stepper also includes advanced controls, monitoring and diagnosis functions that provide accurate control and a safe process. The stepper also comes with a high-precision registration and alignment unit that incorporates a dual set of 4-axis linear motors and an encoder. This machine is designed for very accurate and stable registration and alignment during the exposure process. The stepper also features a number of advanced wafer handling technology such as wafer cleaning and inspection, wafer substrate and frame alignment, wafer substrate and frame verification, wafer substrate recognition, and wafer-residual edges recognition. PAS 5500/100D is also equipped with advanced safety systems that are designed to ensure personnel safety and wafer handling. The stepper includes a fire prevention tool and an aerosol release asset that can stop the processing steps when necessary. The stepper has also been designed to protect against environmental conditions that could damage the sensitive optical components of the model or affect the wafer process. The stepper also guarantees maximum performance for crystalline structures as well as for amorphous structures. PAS 5500 / 100D is a perfect choice for any photolithography applications that require precise and reliable operation.
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