Used ASML PAS 5500 / 1100 #293655010 for sale

ASML PAS 5500/1100 is a motion control and metrology tool for semiconductor device manufacturing. It is a production-class step-and-scan tool equipped with a one-substrate-per-process step-and-repeat lithography system. The PAS 5500/1100 employs a quartz halogen lamp with an energy output of 135W to print on a wafer. The lamp operates in the ultraviolet (UV) range, providing optimal lithography capabilities. The wafers are scanned using linear galvano motors, which have an extremely high precision, providing an accurate and consistent printed pattern on the substrate. In order to ensure that the printed pattern is true to design, the PAS 5500/1100 is also outfitted with a laser interferometer, which measures the deviation of the printed pattern from established criteria. The PAS 5500/1100 also provides a specialised alignment facility which enables it to precisely align the pattern over a range of different wafer types. This is made possible by a combination of contrast imaging, focusing attenuation and sidewall angle determination. Pattern overlapping is further enhanced by the use of alignment marks, which act as fiducial reference points for both measuring and alignment. Intensity measurements, contrast imaging and fiducials are all checked continuously during alignment. With its ultrafast throughput, the PAS 5500/1100 also offers an ideal platform for Advanced Process Control. The system can detect process variations and output warning signals long before the process step has been completed. This allows engineers to take corrective action before any non-conforming wafers are produced. Finally, the PAS 5500/1100 is designed with a low total cost of ownership in mind. This is achieved by its ability to reduce the overhead time between process steps, reduce the number of maintenance operations, and by optimizing the substrate transfer time through the wafer stepper. Combined with its compact size, high precision and non-stop operation, the PAS 5500/1100 is an ideal solution for high-volume semiconductor device production.