Used ASML PAS 5500 / 150 #293817872 for sale
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ID: 293817872
i-Line stepper
Numerical Aperture (NA): 0.6
Resolution: 350 nm
DCO: 50
Throughput (WPH): 80.
ASML PAS 5500 / 150 is a highly advanced wafer stepper that plays a crucial role in the semiconductor industry for photolithography processes. ASML, a leading manufacturer of semiconductor equipment, is known for its cutting-edge technology and innovative solutions in the field of lithography. ASML PAS 5500/150 is a deep ultraviolet (DUV) stepper with a wavelength of 248nm, which allows for high-resolution patterning on silicon wafers. This stepper is designed to address the increasing demands for finer geometries and enhanced performance in semiconductor manufacturing. With a track record of reliability and precision, PAS 5500 / 150 is a popular choice among semiconductor manufacturers for its advanced features and capabilities. One of the key features of PAS 5500/150 is its high precision stage equipment, which enables accurate positioning and alignment of the wafer during the exposure process. This ensures that patterns are transferred onto the wafer with high fidelity and minimal distortion. The stepper also incorporates advanced autofocus and leveling systems to maintain optimal focus and flatness across the entire wafer surface. ASML PAS 5500 / 150 is equipped with a sophisticated illumination system that includes variable numerical aperture (NA) options for controlling the resolution and depth of focus. This allows users to adjust the imaging parameters according to the specific requirements of the lithography process, enabling the production of patterns with varying dimensions and complexity. In addition, ASML PAS 5500/150 features a versatile reticle stage that supports both binary and phase-shift mask technologies. This flexibility allows users to choose the most suitable mask type for their specific patterning needs, whether it involves simple binary patterns or advanced phase-shifting techniques for sub-wavelength lithography. The stepper is also equipped with a state-of-the-art alignment and overlay unit that ensures accurate registration of multiple layers during the lithography process. This is essential for achieving tight overlay margins and precise alignment of different patterns on the wafer, especially in advanced multi-layer device fabrication. Furthermore, PAS 5500 / 150 incorporates advanced software control and automation capabilities for optimal tool performance and productivity. The machine is designed for high-throughput manufacturing environments, allowing for efficient operation and rapid wafer processing to meet demanding production schedules. Overall, PAS 5500/150 is a sophisticated wafer stepper that offers advanced capabilities for high-resolution, high-precision lithography processes in semiconductor manufacturing. Its innovative features, reliable performance, and flexibility make it a valuable tool for semiconductor manufacturers seeking to push the boundaries of device miniaturization and performance in today's competitive market.
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