Used ASML PAS 5500 / 20 #293817873 for sale
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ID: 293817873
Stepper
Numerical Aperture (NA): 0.4
Resolution: 700 nm
DCO: 125
Throughput (WPH): 50.
ASML PAS 5500 / 20 wafer stepper is a valuable tool for semiconductor manufacturing, offering high quality photolithography processes, differentiated by its advanced optical design and imaging resolution. This stepper is designed with a large 20 inch diaphragm field and is capable of producing and inspecting structures with an exposure area ranging from 0.5 mm² to 200 mm². This stepper has an instrument resolution of 2500 x 2500 Half Pitch Line/Space (HPL/S) with an alignment accuracy of 0.2 microns (µm) and a total imaging range that can be extended to 250 mm x 200 mm. PAS 5500 / 20 is designed with a 5x reduction and lithography system using incandescent lamps and high contrast projection optics, providing an overall reduction of a 4 mm wafer carried up to 5x, resulting in a 0.8 mm image field size. A wide range of options can be added to the stepper including customized lenses, spectral filters, and automation software. To enhance the stepper's precision and increase its accuracy for each pattern pin, it's designed with mix and match technology that allows for different pins to be adjusted independently. ASML PAS 5500 / 20 also has an advanced lighting system that is designed to provide uniform illumination while allowing for average throughput speed of 100 wafers per hour. It also has built-in alignment features that allow for easy and fast alignment of wafers with structures for further accuracy. The stepper is also designed with in situ measurement capability that allows for near-instantaneous characterization of wafers and fast identification of any anomalies or droplet scale faults. The compact design allows for easy installation in semiconductor cleanrooms with a height of only 138 cm and a total width and length of approximately 92 cm x 101 cm respectively. With its efficient cooling system, low maintenance requirements, and its low environmental impact, PAS 5500 / 20 is an ideal tool for performing critical photolithography processes in the semiconductor industry.
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