Used ASML PAS 5500 / 200 #9095592 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

Manufacturer
ASML
Model
PAS 5500 / 200
ID: 9095592
Wafer Size: 8"
Stepper, 8" Scan speed: 320 mm/sec Reticle size: 6" Chuck: Pin chuck Wafer: Flat zone Flow: Right Computer: SPARC-5 ASML Software version 8.7.0 with Y2K completion (2) WL Ports Lens type: (80) Max NA: 0.6 BMU: Standard Power supply Temperature control Electronic control: WS lamp Reticle changer Wafer changer ASML 200 lens data FEM UL: 0.02 UR: -0.08 C: 0 LL: 0 LR: 0 IQC Focus: 65.85 Pressure: 967 Dose Respectability: 0.08 % Accuracy: 0.05 % Sum: 0.13 % Uniformity Percentage: 4.27 Tilt X: -0.04 Tilt Y: -0.66 Distortion Max DX: 34 nm Max DY: 68 nm NCE X: 36 nm NEC Y: 37 nm Currently de-installed.
ASML PAS 5500 / 200 is an high-end wafer stepper that combines a large field of view with advanced imaging and pixel-level alignment accuracy. This stepper offers high-resolution imaging and enhanced process performance, making it perfect for semiconductor fabrication applications. ASML PAS 5500/200's total field of view is 43 mm, providing a full range of substrate imaging. The stepper's maximun resolution is 5.6 microns, with a high-precision line-width resolution of 1.5 microns. Additionally, PAS5500 / 200 provides advanced pixel-level alignment accuracy with 21 nm Level of accuracy with Edge Overlap. This allows for precise printing of critical pattern layers with maximum process repeatability. The stepper comes with a variety of features and controls that make it ideal for sophisticated and delicate semiconductor fabrication processes. PAS 5500/200 features Y-axis Scanning for scanning of small patterns, ensuring maximum accuracy in feature size and position during patterning. The stepper also features variable dose mode for precise, non-uniform dose distributions, reducing total exposure dose and energy consumption. The stepper is built with a durable air-bearing frame and scanner head, providing maximum system stability and also comes with a symmetric design to maximize motion accuracy. ASML PAS5500 / 200 also includes a powerful host computer that provides powerful application control, support for a variety of user interfaces, as well as manual control of optical system parameters. Overall, PAS 5500 / 200 wafer stepper is an advanced, high-end imaging and alignment solution for precision semiconductor fabrication applications. With its quality imaging capabilities, enhanced process performance, and integrated control system, users can enjoy efficient and accurate performance.
There are no reviews yet