Used ASML PAS 5500 / 250 #293817869 for sale

ASML PAS 5500 / 250 is a full-field step-and-repeat lithography scanner built by the Netherlands-based Advanced Semiconductor Materials Litechnology (ASML). It is used in the production of semiconductor integrated circuits and other micro-electronic devices. The stepper consists of an isolated structure, a long-lasting and high precision optics assembly, and a computer control equipment. The isolated structure isolates vibration from the environment, which ensures that the alignment and position of the optics from the mask to the wafer remain accurate. The optics assembly contains a robotic wafer and mask handling module, 3 mirrors with precession encoders, several lenses, two galvanometer scanners for beam deflection, and two digital image stretching units. The combined optical system, with a minimum lens acceptance angle of 5 degrees, has a resolution of 0.25 microns for both IC patterning and overlay functions. The control unit is designed to control, monitor, and record the stepper functions. It consists of a graphical user interface (GUI) with color-coded bezels to signify the process state, a high-level function menu, and color-coded keypad. The machine is also equipped with an Automatic Distance Control (ADC) tool, which uses image recognition algorithms to adjust the distance between the mask and wafer as needed. ASML PAS 5500/250 stepper is capable of processing substrates up to 8-inch (200 mm) in size, with throughputs up to 395 wafers per hour. It is also available with a wide range of options that can enhance both the process performance and throughput, including built-in coater/developer, a load lock chamber, and wafer washing/measurement facilities. In summary, PAS 5500 / 250 is a full-field step-and-repeat lithography scanner used in the production of integrated circuits and other micro-electronic devices. It features an isolated structure, a high-precision optics assembly and a computer control asset, to ensure the desired accuracy of the patterning and alignment process. The stepper is also capable of processing substrates up to 8" in size, with throughputs up to 395 wafers per hour.