Used ASML PAS 5500 / 250 #9166553 for sale

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Manufacturer
ASML
Model
PAS 5500 / 250
ID: 9166553
Wafer Size: 8"
i-Line stepper, 8" ARMS Option Image field size: X: 22.0 mm Y: 22.0 mm Diameter: 31.1 mm Steps: X: 11 Y: 11 Measurement type: Sample mode Lamp power (W): 3150.0 Samples per position: 50 Apply REMA window: Yes Load reticle: N Illumination mode: Annular Numerical aperture: 0.58 Sigma outer: 0.800 Inner: 0.450 Uniformity measurement result: Uniformity (%): 1.79 Logfile: LI / LIUM / waf.941 (121) Measurements Tilt: X (% / field): 0.74 Y (% / field): -0.18 Overall average: Ratio: 1.00 Standard deviation: 0.01 Intensities spot sensor (mW / cm2): 1706.65 Standard deviation: 12.48 Intensities energy sensor (mW / cm2): 1706.75 Standard deviation: 5.10 Lamp time lit (hour): 1866:42 Estimated uniformity from measured data (%): If corrected: Actual tilts: 1.78 Gradient filter: 1.54 Tilts and with gradientfilter: 1.26 Symmetric uniformity value (%): -0.52 Currently installed.
ASML PAS 5500 / 250 is a sophisticated wafer stepper designed for production-level lithography tasks in semiconductor device fabrication. It is a Next Generation Scanning (NGS) equipment that can process up to 25 wafers per hour with a resolution of 0.25 microns. This wafer stepper delivers the highest level of throughput and resolution in its class. At the heart of the system is an advanced scan lens assembly that employs an 8-channel multi-scanner configuration. This setup allows for a much higher throughput than other steppers, making it an ideal choice for manufacturers looking to maximize production speed. The lens provides a minimum resolution of 0.25 microns, which is necessary for many lithographic processes in advanced semiconductor device fabrication. The unit also incorporates a unique feature known as Advanced Dispersive Optics (ADO). This is a technology that uses a combination of multiple lenses and mirrors to facilitate better image resolution. This technology helps to eliminate aberrations and improve resolution, enabling the stepper to maintain its high professional levels of accuracy. In addition, ASML PAS 5500/250 has a range of support functions. For example, it has an automated wafer loading machine along with a variety of features to ensure a highly precise alignment of the wafer. It also features an integrated cooling tool for maximum efficiency and lifetime of the lenses and components. The stepper is also equipped with a comprehensive GUI (graphical user interface) that simplifies operation and programming. This makes it easy for beginners to quickly become familiar with the asset, allowing them to perform complex lithography tasks with ease. PAS 5500 / 250 is a powerful and reliable wafer stepper, providing manufacturers with the highest levels of throughput and resolution in its class. Its ADO technology and comprehensive support functions make it a great choice for high-precision lithography applications.
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