Used ASML PAS 5500 / 275D #293817866 for sale
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ID: 293817866
i-Line stepper
Numerical Aperture (NA): 0.48-0.60
Resolution: 280 nm
DCO: 40
MMO: 80
Throughput (WPH): 120.
ASML PAS 5500 / 275D is a modern wafer stepper used in photolithography applications that help fabricate semiconductor devices. It is a highly efficient wafer stepper that enables high-precision lithography patterns to be written onto the wafer. This stepper uses an advanced scanning technology, synchronizing a mask holder, wafer carrier and optical head in a single template. PAS 5500 / 275D is a vector scanning stepper which uses digital drive systems, magnetic bearings and an advanced projection equipment to achieve high accuracy positioning of the reticle holders. Its four-axis precision motion control provides fine alignment of the mask and the wafer, making it suitable for fine overlay applications. The device also features a wafer handling system that is reliable and robust. It has an efficient illumination unit which uses two-dimensional focusing optics and a binary pupil machine to reduce the amount of energy used to expose the wafer. This also helps it maintain low energy consumption while providing superior performance. The stepper also has an automatic pattern recognition tool that helps achieve high throughput and yield in patterning applications. ASML PAS 5500 / 275D has an advanced control asset which ensures accurate and repeatable exposure processes. It reduces the time required to setup a production run, thereby improving the performance and efficiency of the process. Finally, it is equipped with an on-board communication interface for remote diagnosis and monitoring of lithography operations. Overall, PAS 5500 / 275D is a highly capable and efficient wafer stepper which helps fabricate reliable and repeatable semiconductor devices. It has a robust construction, and its advanced automation, digital drive systems and optics enable it to achieve high resolution imagery with minimal power consumption. In addition, its remote communication interface allows users to monitor lithography operations and adjust parameters if necessary.
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