Used ASML PAS 5500 / 300 #293814115 for sale

ASML PAS 5500 / 300
Manufacturer
ASML
Model
PAS 5500 / 300
ID: 293814115
Wafer Size: 8"
Deep Ultraviolet (DUV) steppers 8".
ASML PAS 5500 / 300 is a fully automated wafer stepper equipment designed to supply solutions for integrated circuit fabrication. The system offers a platform for alignment, lithography, and metrology (measurement) for wafers. Wafer steppers provide lithography for device fabrication on wafers, with stringent cycle times and high precision placement and overlay requirements. The unit consists of the hardware and software components to run the lithography process, including several key components. First, a stepper is designed to move the wafer through several stages of lithography imaging and patterning. The stepper contains several pieces of hardware, such as a stepper column, a wafer stage, and a lens. The stepper column is designed to precisely move the wafer under the lens and image it on the wafer surface. The wafer stage is designed to hold the wafer in place during the imaging processes and can be mechanically adjusted for different sized wafer. The lens can be exchanged for different lens types and power levels for different layers on the wafer. The machine's optical components allow for high precision alignment of the lithography pattern to the wafer. A pattern generator generates an electronic representation of the pattern to be applied on the wafer surface. Optical sensors can detect the surface features of the wafer in order to align the pattern over it. The pattern is then etched onto the wafer using laser optics. The tool's metrology tools are also used to measure the circuits patterned on the wafer. These tools include optical scanners, capable of precisely measuring the dimensions of the pattern on the wafer. The asset also contains several types of camera systems to provide an image of the wafer after the imaging and patterning has been completed. ASML PAS 5500/300 is a versatile wafer stepper machine capable of performing a wide range of lithography tasks with very high precision. From an industrial standpoint, it is a reliable platform with an extremely fast cycle time and capabilities of alignment and meeting demanding overlay requirements. The model offers a versatile approach to integrated circuit fabrication and is well suited for many industry applications.
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