Used ASML PAS 5500 / 300 #9162889 for sale

ASML PAS 5500 / 300 is an advanced, high-precision wafer stepper that is used in semiconductor device manufacturing to expose integrated circuit patterns or pictures on a photoresist material deposited on the surface of each wafer. The high-precision stepper is built with the use of advanced lithography technology and can perform a wide variety of imaging functions such as mask projection, mask pellicle, and resist printing. ASML PAS 5500/300 has a high-precision optical system that allows for accurate imaging of the patterns or pictures onto the photoresist material. The system includes an advanced projection lens, an x-y-z movable stage, and a high-energy illumination source. The projection lens provides a high-resolution image, while the stage allows for precise manipulation and positioning of the wafer beneath the lens. The illumination source is a high-energy illuminator that is designed to project the desired pattern or picture onto the wafer. PAS 5500 / 300 is designed to be used in a cleanroom environment in order to maintain an exceptionally high degree of accuracy in imaging. In order to minimize the risk of contamination and imperfections, the stepper is designed to minimize movement of the wafer in order to keep all components within the same plane. This ensures that the desired pattern or picture is precisely and accurately exposed on the photoresist material. PAS 5500/300 is an extremely user-friendly machine. An integration of computer-controlled software and hardware enables users to quickly and easily setup imaging jobs and maintain consistent performance. Auto-aligning mechanisms are designed to precisely expose the wafer during every cycle, without the need for manual alignment. The stepper can be infinitely fine-tuned to ensure maximum accuracy in the exposed patterns or pictures on the wafer. Additionally, the stepper provides users with a variety of reporting capabilities to ensure consistent performance and production yield. ASML PAS 5500 / 300 is designed to provide consistent, reliable performance in high-precision lithography applications. The stepper is incredibly accurate and can precisely expose patterns or pictures with exact resolution and detail, while also being scalable and user-friendly. This makes ASML PAS 5500/300 an ideal choice for semiconductor device manufacturing.