Used ASML PAS 5500 / 300 #9188016 for sale
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ID: 9188016
Wafer Size: 8"
Vintage: 2000
i-Line stepper, 8"
Software version: 8.8.6
Hardware configuration (Fab):
OCU-Console
Main body
Electronic cabinet
Handler system: WTS
Hardware configuration (Subfab / Auxilliary units):
TCU
AAR Cabinet
Transfomer
Charcoal filter cabinet
Cymer laser
Equipment configuration:
CPU Type: SPARC5
CM Options:
Lens number: 0107577b
Lens type: 78
Field diameter: 31.1
ARMS / RMS: ARMS
Chuck type: SiC
Athena: Yes
Currently de-installed and warehoused
2000 vintage.
ASML PAS 5500 / 300 is a high-precision wafer stepper for lithography. It is an optical projection printers, comprised of a high power light source, precision optic elements, and a stage equipment that follows a predetermined pattern of movement. The wafer stepper works by first coating the wafer with a light sensitive material called a photoresist. Then, a large-scale mask containing a computer-generated pattern is placed between the light source and the wafer. The light source illuminates the pattern which is in turn projected onto the wafer. The precision stage system then moves the wafer in relation to the mask, allowing for minute changes in focus and position to ensure that each successive image is accurately transferred. This kind of precision is crucial for aligning the tiny circuit elements as the wafer is projected with successive patterns. In the case of the ASM ASML PAS 5500/300, the accuracy is insured by the use of an advanced Piezo combining motion. This unit fine-tunes the exact position and and velocity of the stage machine at all time, assuring the highest degree of accuracy without reliance on a pressure controller or large moving mass. In addition to its impressive accuracy, PAS 5500 / 300 features a proprietary double frequency (DFL) imaging method. This method combines two completely independent imaging systems in one axis, allowing for increased exposure times, which results in more efficient photolithography. In conclusion, PAS 5500/300 is a high-precision wafer stepper specifically designed for photolithography. With its advanced Piezo combining motion and double frequency imaging, ASML is the perfect choice for any application that requires the highest degree of accuracy.
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