Used ASML PAS 5500 / 300B #100797 for sale

ASML PAS 5500 / 300B wafer stepper is a critical device used in semiconductor fabrication. As a part of the lithography process, wafer steppers are used to project a pattern onto the wafer, allowing the targeted area to be etched, processed, or manipulated in some way. PAS 5500 / 300B is optically aligned, and contains an illuminator, projection optics, alignment optics, support and motion systems, a lighting equipment, and a vacuum system. The illuminator is the source of the projected light, and contains a number of lamps, lamps receptacles, a shutter drive, and a shutter lens. The illuminator also provides protection from mechanical backlash or thermal shock of the components. Depending on the state of exposure, the desired exposure will be selected. The projection optics are the device responsible for creating the image that is projected onto the wafer and includes an objective lens, condenser lens, imaging lens, and an optical filter. The objective lens focuses the light onto the wafer, and the condenser lens focuses the light onto the imaging lens. The imaging lens then shapes the projected image, and the optical filter is used to select the wavelength of light that is used for a particular exposure. The alignment optics handles the handling and movement of the wafer during the process. The alignment optics control the starting and stopping of the exposure process as well as maintain the alignment of the wafer to the imaging lens. The support and motion unit provides alignment between the wafer and the projection optics. Original overlay accuracy, which is the process of putting the exposure patterns on the wafer accurately and in the correct alignment, is maintained with the support and motion machine. The tool includes many pieces like, a field of view measurement module, a motion stage, a focus controller, a laser interferometer, and a computer interface. The lighting asset is the power supply responsible for all the electrical components of the model and includes a digital lighting control module, a remote power control module, power amplifiers, digital amplifier controllers, and amplifiers. The vacuum equipment is responsible for the substrate chamber that holds the wafer as well as other components. It maintains the pressure during the process and is responsible for keeping the wafer clean while it is being exposed. It also helps keep contaminants from entering the chamber and prevents oxidation from occurring during the exposure process. Overall, ASML PAS 5500 / 300B is an incredibly important device for semiconductor fabrication. With the combination of its illuminator, projection optics, alignment optics, support and motion system, lighting unit, and vacuum machine, it can accurately and precisely create the images that are used to manipulate and shape semiconductor chips.