Used ASML PAS 5500 / 300C #144388 for sale

ASML PAS 5500 / 300C is a state-of-the-art wafer stepper designed to reduce manufacturing costs and improve process efficiency. It is a 25 nm +, 5-step optical projection stepper with a maximum process accuracy of ± 0.8 μm. The 300C features a large LCD-based user interface that makes it simple to set up and operate. Additionally, its fully automated alignment equipment allows users to quickly and precisely check any wafer orientation prior to each exposure step. The 300C utilizes an advanced, five-mask pattern projector system, capable of imaging large fields of view at high speed. The five-mask projection unit consists of a single master-incident light source and four master-incident detectors. The master-incident light source is responsible for producing five optical images that are used for imaging large fields of view onto the wafer. Furthermore, this technology allows for greater speed and accuracy than traditional single-mask projection systems. Additionally, the 300C is outfitted with improved pattern matching and overlay functions, enabling fast and accurate alignment of multiple images. In addition to image projection and pattern recognition, the 300C utilizes a patented multistage high-resolution imaging technology. This technology uses two separate stages to acquire high quality imaging of the wafer during each step of the process. The first stage acquires the projected pattern and the second stage acquires the necessary focusing information to correctly focus the pattern. The 300C utilizes an advanced, split-optical machine. This tool uses two separate optical systems, allowing users to maintain maximum resolution and accuracy during the entire process. Furthermore, the split-optical asset decreases scan time by maintaining the same amount of light intensity during all process steps. The 300C utilizes a high-precision beam scanner which allows for ultra-high precision imaging at speeds up to 5 μm/second. The plane parallel laser optical panel allows for the highest possible accuracy when imaging large fields of view. Furthermore, this technology can be used for complex pattern imaging and mask alignment. Overall, ASML PAS 5500/300C is an advanced wafer stepper that provides high accuracy and performance. Its patented multistage imaging technology, dual optical systems, and high-precision beam scanner enable manufacturers to obtain higher quality yields with improved throughput and increased cost savings.