Used ASML PAS 5500 / 300C #293746594 for sale
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ID: 293746594
Wafer Size: 8"
Vintage: 2000
Stepper, 8"
CYMER ELS-5600 Laser
DONALDSON P198475 Filter
ARMS Reticle handler
Wafer handler
IL Bottom module
CT Cabinet
Electronic cabinet
OCU Unit
ARMS Control unit
Cover cart
2000 vintage.
ASML PAS 5500 / 300C is a state-of-the-art wafer stepper, used for the production of advanced integrated circuits (ICs) or microchips. It is a maskless stepper, one of the leading lithography systems for high-end applications. ASML PAS 5500/300C is specifically designed for both 2D and 3D lithography applications. The equipment provides repeatability with increased process efficiency due to its advanced technology and automation. It has a scan speed of 1.6× magnifications which translates to more than 80 wafers per hour. The system is based on a unique dual-stage optical unit. It features a two-axis alignment machine, an advanced beam scanning unit, and a high-performance imager. The integrated optics platform provides superior optical performance and superior throughput, allowing faster wafer processing. PAS 5500 / 300C is a world-class maskless stepper, capable of performing highly accurate exposure. It features a number of features that are designed to ensure the highest level of precision and repeatability. The tool utilizes a number of technologies for stable and accurate pattern overlay including: Correlation-based Alignment, Overlay Compensation, Alignment Pattern Matching, and Edge Refinement algorithms. The asset is well-regarded for its Maskless Programmable Asymmetry (MPA) feature. This feature enables adjustable exposure parameters to compensate for variations in overlay and proximity. With MPA, the wafer surface area can be successfully reduced, resulting in a higher degree of accuracy and cost-effectiveness for IC production. In addition, PAS 5500/300C features a novel acquisition model, featuring advanced image comparisons, defect detection and aberration measurement capabilities. It also features a patented Photomask-Maskless-Transfer technology that enables users to transfer patterns from optical mask to wafer more accurately than ever before. ASML PAS 5500 / 300C can be easily integrated into any lithography equipment and it is supported by a broad range of software tools, making it more versatile than ever before. It is an ideal tool for the production of high-volume integrated circuits and other advanced micro-components. With its higher degree of accuracy, repeatability, and cost-effectiveness, ASML PAS 5500/300C has become a leading choice for advanced semiconductor manufacturing.
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