Used ASML PAS 5500 / 300C #293817864 for sale

ASML PAS 5500 / 300C Wafer Stepper is a complex lithographic equipment used for patterning semiconductor wafers. The system is designed for the production of 300mm wafers and features a high resolution scanner, a varying numerical aperture (NA), and a range of illumination configurations. ASML PAS 5500/300C Stepper is capable of supplying a high numerical aperture (NA), ranging from 0.200 to 0.63. The unit has a field size of 300mm and it is equipped with an XY resolution of 0.1 µm, making it ideal for semiconductor production processes. It is specifically designed to provide the ultimate in reliability, accuracy and resolution for large pattern-area imaging lithography. PAS 5500 / 300C features a high resolution scanner that is capable of scanning an adjacent field with only a 3 mm resolution gap. The scanner can operate at up to an approximately 1000 mm/sec scan rate, making it suitable for high throughput production. Additionally, its optical machine is capable of accommodating a variety of illumination configurations, including Koehler, annular and uniform field. Furthermore, the tool is capable of using a wide range of excimer and diode pumped solid state laser light sources, including the ArF (argon fluoride) laser. In addition to its advanced imaging capabilities, PAS 5500/300C Wafer Stepper also has a set of automation features, which are aimed at simplifying the patterning process. It features an automated wafer handling asset, which allows for fast exchange of wafers and masks. Furthermore, it is equipped with an integrated process controller, allowing for real-time control of the model. Finally, the equipment is powered by a single-chip architecture that is designed for high-speed and ultra-low overhead in image processing. Overall, ASML PAS 5500 / 300C Wafer Stepper is one of the most advanced systems for patterning semiconductor wafers. Its high resolution scanner, variable numerical aperture, and advanced automation features make it ideal for producing large pattern-area lithography. Its single-chip architecture and integrated process controller also offer superior performance, making it a go-to solution for semiconductor fabricators.