Used ASML PAS 5500 / 300C #9197509 for sale

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ASML PAS 5500 / 300C
Sold
Manufacturer
ASML
Model
PAS 5500 / 300C
ID: 9197509
Wafer Size: 6"
DUV Stepper, 6".
ASML PAS 5500 / 300C is a fully automated wafer stepper used in semiconductor device fabrication. This tool is designed to manufacture complex integrated circuit chips with ultra-precise patterns, using deep ultraviolet (DUV) light sources that can be scanned to precisely expose photoresist-coated wafers. ASML PAS 5500/300C offers high throughput processing speed and superior uniformity for the most advanced chip designs, with the ability to process hundreds of wafers in a fraction of the time it would take a manual stepper equipment to complete the same tasks. Its primary advantage is its high performance lithography system that delivers extremely tight focus and accurate exposure throughout the entire process. This is achieved through its advanced software and hardware, including an optical scanner with a large field of view, integrated sensors, and a motorized stage for precise wafer placement. The scanner's large field of view allows PAS 5500 / 300C to process both small and large jobs at the same time, reducing the process time significantly. Additionally, PAS 5500/300C has a field flattening lens that levels out pattern variations across the entire field of view. ASML PAS 5500 / 300C is also designed with several features that increase its overall efficiency. For instance, the 'pre-alignment' procedure quickly aligns the wafer orientation, then the 'auto-centering' procedure rapidly refocuses and optically aligns the photoresist pattern. The 'multi-step strategy' allows for multiple wafers to be exposed in the same position, further speeding up the process, while its Software Development Kit (SDK) gives users the power to develop their own process recipes. ASML PAS 5500/300C also includes several other features to improve flexibility and performance, such as its Time Multiplexer (TMX) mirror and collimating lens, and its laser-based wafer thinning unit. Additionally, an optional auto-focusing machine can be added for even greater accuracy. Other process options include area background clearing, resolution tuning, noise correction, and polarization correction. In summary, PAS 5500 / 300C is an advanced and highly capable lithography tool that offers a number of performance, accuracy, and efficiency features. Its expansive field of view, integrated sensors and motorized stage, software systems, and optional accessories make it an ideal tool for both large volume production and precise small chip design processes.
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