Used ASML PAS 5500 / 300C #9218126 for sale

ASML PAS 5500 / 300C is a high performance, wafer stepper/scanner equipment, manufactured by ASML. It is designed for high-end photolithography of integrated circuits and other devices. ASML PAS 5500/300C offers high-resolution imaging over a large field of view, with excellent uniformity. PAS 5500 / 300C has a compact design structure with a base frame that includes a main turntable and a vacuum plate. The outer structure of the system provides environmental protection, and the optical elements are rigidly mounted to reduce vibration. The optical components, including lenses, are integrated within the control console. It has four-beam channels with optical enhancement unit and a variety of illumination configurations for fine feature resolution. To provide the highest resolution, PAS 5500/300C has a 1.55 micron laser spot size, a beam-pointing accuracy of 1.2 microns, and an auto-focus machine with a range of 0.5 to 7.5 microns. The tool has a full spread illumination asset to provide uniform exposure across the image field. It also utilizes a reverse telecentric optical model for improved uniformity and repeatability. The movement of the wafer is controlled by a computer-controlled, stepper-based motion equipment. This system applies less force to the wafer than conventional methods and provides improved uniformity and repeatability. It is capable of achieving speeds up to 17.5mm/sec, which is sufficient for most applications. The unit can handle a wide range of wafer sizes and a variety of materials. For special applications, it also offers an option for larger fields-of-view and columnated shapes. In addition, a plate attachment is built-in to allow for direct imaging of enclosed substrates. ASML PAS 5500 / 300C offers many features to provide high-throughput performance, such as a rotatable pattern file, a batch job queue, and a pattern comparison tool. This machine can also create high-precision image patterns, making it suitable for production line applications. Overall, ASML PAS 5500/300C is a reliable and efficient tool to meet a variety of photolithography needs. With its large field of view, resolution, and uniformity, it is suitable for a wide range of integrated circuit applications. In addition, its stepper-based motion asset and multiple illumination configurations provide high-throughput performance.