Used ASML PAS 5500 / 350C #9137673 for sale

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Manufacturer
ASML
Model
PAS 5500 / 350C
ID: 9137673
Vintage: 2009
DUV Stepper, 8" 2009 vintage.
ASML PAS 5500 / 350C is an innovative wafer stepper equipment for microlithography applications. This stepper has a unique design that enables it to produce high-quality lithographic printing on small structures. ASML PAS 5500/350C is equipped with a specialised optical system and uses state-of-the-art technology to provide a reliable and repeatable process. The unit has a positioning accuracy of 1 micron and an aperture size of 20 microns, and features latest laser technologies for superior exposure performance. PAS 5500 / 350C is powered by a 350 watt Krypton laser, which enables high resolution imaging and reliable, fast patterning time. This laser is capable of delivering up to 17nm feature sizes at 70w/cm2 intensity. The wavelength of the laser is 6.45 microns, which is optimal for exposing the advanced photoresists used in microlithography. The laser has an output ranging from 350 watts to 1.2 kW. PAS 5500/350C utilizes high-accuracy alignment and focus systems. This stepper has a patented low-dispersion objective lens machine for imaging. The objective lens operates in both the 0.55 numerical aperture (NA) and 1.2 NA modes. This supports feature sizes ranging from 10nm to 1 micron. ASML PAS 5500 / 350C is equipped with a high-speed scanhead. It scans large fields of exposure with an imaging rate of up to 5MHz. The zoom optics provides the optimum scan spot size for the imaging, which ensures superior image quality. ASML PAS 5500/350C is controlled by a powerful and easy-to-use software package. This stepper has a user-friendly graphical interface and is capable of excelling in multiple industry applications. It supports automatic pattern recognition, and provides process feedback that ensures optimal throughput performance. PAS 5500 / 350C is an innovative and powerful wafer stepper tool for microlithography applications. It utilizes state-of-the-art technology, and is capable of delivering high-quality, precise imaging with superior patterning time. This asset makes it easier and faster for the users to achieve their desired results.
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