Used ASML PAS 5500 / 400 #293817861 for sale

ASML PAS 5500 / 400 is a high-precision, 5-axis automated wafer stepper designed for high-volume production of microlithography components. This stepper utilizes a Koch/Oerlikon-patented scanning technology to enable precise scanning of semiconductor wafer surfaces to form patterns for semiconductor components with its built-in fast-scanning capabilities. PAS 5500 / 400 features an innovative wafer chuck equipment to enable precise wafer handling and alignment, as well as providing precise control of the stepper's scanning speed and acceleration. The stepper also features precise and repeatable motor control, allowing for precise guidance of scanning speed and acceleration as well as adaptive compensation to allow consistently precise, repeatable scan patterns. To ensure stable wafer handling and alignment, the stepper has an advanced, automatic actuator system that ensures precise alignment of the chuck to the moving table. The optics unit of ASML PAS 5500 / 400 is designed for very high accuracy and with a 300MM (12 inch) focus field size. It is designed to produce submicron-level patterns with maximum overlay, pitch, focus and linearity accuracy. It also has an adjustable optical machine that enables precise optimization of exposure and focus variability. The tool also features a cluster-level networking capability, which allows for remote access to asset status and data as well as remote operation and control of the stepper in case of model failure. In addition to this, the stepper has built-in diagnostics capabilities that enable users to diagnose the components of the stepper, such as optical and motor performance, to ensure optimal operation. PAS 5500 / 400 is ideal for use in a production environment, offering high-precision, repeatable and reliable results that can be replicated time and time again. Its advanced features and design make it suitable for a variety of applications and its user-friendly interface and networking capabilities make it an ideal choice.