Used ASML PAS 5500 / 400C #9049031 for sale

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Manufacturer
ASML
Model
PAS 5500 / 400C
ID: 9049031
Vintage: 1993
i-Line Stepper, 8" Process: i-line 4x Uniformity: 1.0 Software: UNIX Basic configuration: SMIF SECE I/II 6" Reticle Wafer OF type: flat zone Inline flow right Software: Main computer: ULTRA-10 Software version v8.9.0 Y2K completion WL&RL: WL port numbers 1 and 2 Lens and illumination: Lens type: 40 Max NA: 0.65 BMU type: Standard Apperture annular: 0.85/0.55 Laser: lamp Stage: 250mm/sec, pin chuck Packing list: Main Power supply device Air pressure control S&T temp control electronic control OCU Reticle change Wafer changer 1993 vintage.
ASML PAS 5500 / 400C wafer stepper is an advanced microlithography machine used widely in the semiconductor manufacturing industry. It allows for the precise fabrication of integrated circuits that are printed layer by layer onto wafers. The equipment utilizes an optical assembly mounted on a motion-controlled rotation platform, to accurately image patterns onto the surface of the wafer. The imaging system consists of a laser stepper/scanner with an optical assembly containing a projection lens, beam condenser, and a light source. It also includes an advanced infrared imaging sensor, focusing and alignment objectives, and a reticle stage. The wafer stepper is capable of imaging layer upon layer of photoresist onto the wafer, with a resolution of 250nm. The optical assembly mounts allow for a range of reticles, from a basic 1x reduction up to 4x reduction with extended field of view (FOV). Additionally, the unit is equipped with an advanced alignment and leveling machine that provides positional accuracy up to 4nm and a tilt accuracy of 0.2 mrad. The optics can be positioned and controlled in the XYZ directions, with a maximum speed of 1.2 m/s. The wafer stepper is capable of automatically detecting and self-correcting for environmental factors, such as vibration and temperature fluctuations. It makes use of an advanced closed-loop thermal control tool to maintain a uniform temperature. All of this provides the needed accuracy to ensure high-yield device fabrication. Moreover, ASML PAS 5500 / 400 C utilizes a high-end computer for control and monitoring of the asset, and the implementation of predictive models and quality control metrics. In addition, PAS 5500 / 400C is equipped with a high-precision stage for an automatic exchange of wafers and reticles. The model also includes a special safety unit to prevent accidental contact with the optics assembly. The wafer stepper is capable of processing a variety of materials and substrates, from photomasks and optics to quartz wafers and thin films. It can perform multiple operations such as exposing, etching, cleaning, and coating. Overall, PAS 5500 / 400 C wafer stepper is an advanced microlithography equipment that provides high-precision imaging and patterning capabilities for the semiconductor industry. It is equipped with advanced imaging optics, a computer-controlled positioning and thermal control system, and a wafer-to-reticle exchange unit. These features enable the device to identify, compensate, and correct for environmental variations while doing the necessary processing with high precision and repeatability.
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