Used ASML PAS 5500 / 400D #293817859 for sale
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ID: 293817859
i-Line stepper
Numerical Aperture (NA): 0.65
Resolution: 280 nm
DCO: 35
Throughput (WPH): 124.
ASML PAS 5500 / 400D is a high-performance wafer stepper that provides precision lithography and imaging capabilities to the semiconductor industry. It has a resolution of 0.25 microns and can process up to 400mm wafers in separate stages. ASML PAS 5500/400D offers computer-driven, high-speed imaging throughout the entire process and superior throughput that ensures production processes are completed as quickly as possible. PAS 5500 / 400 D is equipped with an integrated imaging equipment that includes several features, including a wafer alignment system, a laser interferometer unit, and an advanced robotics machine. The integrated imaging tool automatically adjusts the machine's wafer motion parameters to enable optimal lithography imaging results without any operator intervention. Additionally, the imaging asset can detect any alignment and positioning errors, and can quickly adjust for any discrepancies. The machine also includes a wide range of customizable features such as heating elements, deflector catalysts, filter assemblies, shutter assemblies, slit-lamp assemblies, and exposure head assembly. The exposure head assembly enables the machine to perform a variety of advanced lithography operations, such as Contour Projection (CP), High Contrast Refresh (HCR), and Depth of Focus (DOF). The internal optics of the machine, such as the laser interferometer and projection optics, are also designed to provide enhanced imaging features. The laser interferometer corrects for any tilt or focus errors and provides precise scanning of the wafer surface. Also, the projection optics are designed to process a wide range of substrates and materials, and can work with different light sources and treatment techniques. The machine also includes a variety of computer software programs that are designed to enhance its functionality, including flexible and accurate mask alignment tools, accurate patch analysis, fast correction of ill-defined regions on the substrates, and advanced Focus, Exposure, and Stop procedures. The supportive software also allows the operator to easily store and access all of the imaging parameters that were used during each wafer run in order to ensure consistent and efficient operation. Overall, ASML PAS 5400/400D is a powerful wafer stepper that offers superior imaging capabilities and a wide array of features designed to enhance production process efficiency, accuracy, and throughput. It is an ideal choice for the semiconductor industry and other industries that require precise lithography operations.
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