Used ASML PAS 5500 / 400D #9207081 for sale

ASML PAS 5500 / 400D is a wafer stepper used to transfer patterns onto the surface of semiconductor substrates. It is a highly precise machine capable of producing complex patterns that support the development of a variety of advanced semiconductor technologies. Through the use of a ultraviolet (UV) light source, state-of-the-art optics, and precise alignment, the stepper is able to rapidly expose a photoresist layer applied to a wafer with an array of extremely small structures. The optics of ASML PAS 5500/400D contain a varifocal lens, platter mirror, and two fold mirrors all of which are utilized in the illumination and imaging of the substrate. The lens is composed of two mirrors that adjust the imaging angle of the print beam and a galvanometer equipment used to control the position of the imaging lens. The platter mirror is used to scan the substrate along the x- and y-axes in order to obtain the desired image resolution. Finally, the two fold mirrors aid in the alignment and focusing of the imaging beam onto the photoresist layer. The stepper is also equipped with a dynamic line generator (DLG), which is used to precisely align the imaging beam onto the wafer with nanometer accuracy. Through the use of DLG's two-dimensional matrix, the beam position is continuously adjusted according to the movement of the wafer. This ensures that the imaging process is accurate and repeatable with each exposure. In addition to the optics, PAS 5500 / 400 D is also equipped with a number of advanced control and safety features. This includes a highly advanced predictive control system, which continuously adjusts the optical imaging angle to ensure that the image remains consistent with each exposure. Additionally, the stepper features a powerful vacuum unit to maintain substrate adhesion to the platter, allowing for the process to occur in an extremely clean environment. PAS 5500 / 400D is a state-of-the-art wafer stepper that is capable of producing precise patterns with each exposure. Its superior optics, advanced DLG, and predictive control machine ensure that the imaging process is accurate and repeatable with each exposure. Additionally, its powerful vacuum tool allows the process to occur in an extremely clean environment. This makes ASML PAS 5500 / 400 D a valuable tool for those in the semiconductor industry who require the highest precision and accuracy in their production process.