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ID: 9049994
Stepper with DNS tracks
Slit Uniformity
Operator:MSA Machine:XXXX Release:8.7.0 Date:09/05/2012 Time:18:01
Comment :
Measurement mode
Scanning : N
Start position : Leftside
Measurement settings
Fieldsize [mm] X : 26.000 Y : 11.940
Steps X : 11 Y : 51
Number of Pulses : 100
Pulse Frequency [Hz] : 1000
Pulse Energy [mJ] : 10.00
Miscellaneous
Apply REMA Window : Yes
Illumination Mode
Illumination Mode : Conventional
Numerical Aperture : 0.57
Sigma Outer : 0.750
Illumination mode name : conventional Version : 1.0.0
Uniformity Measurement Results
Uniformity [%] : 0.48
X-Tilt [%/field] : -1.08
Symmetrical error [%] : -0.14
Logfile : LI/LISU/waf.1225
Overall Average of
Ratio : 1.00 Standard Deviation : 0.00
Intensities Spot Sensor [mW/cm2] : 585.60 Standard Deviation : 1.90
Intensities Energy Sensor [mW/cm2] : 586.80 Standard Deviation : 0.17
Estimated Uniformity from measured data [%]
If corrected for actual tilt : 0.21
If corrected with gradient filter : 0.48
If corrected for tilt and with gradientfilter : 0.07
############################################################################
############################################################################
Slit Uniformity
Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:09:02
Comment : Annular
Measurement mode
Scanning : N
Start position : Leftside
Measurement settings
Fieldsize [mm] X : 26.000 Y : 11.940
Steps X : 11 Y : 51
Number of Pulses : 100
Pulse Frequency [Hz] : 1000
Pulse Energy [mJ] : 10.00
Miscellaneous
Apply REMA Window : Yes
Illumination Mode
Illumination Mode : Annular
Numerical Aperture : 0.57
Sigma Outer : 0.750 Inner : 0.450
Illumination mode name : annular Version : 1.0.0
Uniformity Measurement Results
Uniformity [%] : 0.90
X-Tilt [%/field] : -1.75
Symmetrical error [%] : -0.37
Logfile : LI/LISU/waf.1224
Overall Average of
Ratio : 1.00 Standard Deviation : 0.01
Intensities Spot Sensor [mW/cm2] : 605.13 Standard Deviation : 3.65
Intensities Energy Sensor [mW/cm2] : 606.53 Standard Deviation : 0.12
Estimated Uniformity from measured data [%]
If corrected for actual tilt : 0.42
If corrected with gradient filter : 0.81
If corrected for tilt and with gradientfilter : 0.08
############################################################################
############################################################################
Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:10:38
Uniformity Measurement
Comment :
Image Field Size [mm]
x : 26.0 y : 3.0 Diameter : 40.0
Steps
x : 11 y : 3
Measurement Type : Pulse Mode
Pulses : 100
Pulse Frequency [Hz] : 1000
Pulse Energy [mJ] : 10.00
Apply REMA Window : Yes
Load Reticle : N
Illumination Mode : Conventional
Numerical Aperture : 0.57
Sigma Outer : 0.750
Illumination mode name : conventional Version : 1.0.0
Uniformity Measurement Result
Uniformity [%] : 0.61
Logfile : LI/LIUM/waf.1443
Tilt X [%/field] : -0.91 Y [%/field] : -0.03
Overall Average of
Ratio : 1.00 Standard Deviation : 0.00
Intensities Spot Sensor [mW/cm2] : 586.44 Standard Deviation : 1.93
Intensities Energy Sensor [mW/cm2] : 587.55 Standard Deviation : 0.38
Estimated Uniformity from measured data [%]
If corrected for actual tilts : 0.37
If corrected with gradient filter : 0.45
If corrected for tilts and with gradientfilter : 0.26
Total Nr of Laserpulses since Installation [* 10^6] : 12454.98
Symmetric Uniformity Value [%] : 0.12
############################################################################
############################################################################
Scanning Dose Accuracy & Repeatability Test
Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:09:19
Comment :
Scanning : Y
Scan Direction : Forwards
Scan Type Settings : All scans SingleScan
Die size [mm] X : 2.000 Y : 5.000
Spot Sensor Coordinates on Die [mm] X : 0.000 Y : -2.000
Rema Mode : Die
Number of Repeats for each dose: : 100
Illumination Mode
Illumination Mode : Conventional
Numerical Aperture : 0.57
Sigma Outer : 0.750
Illumination mode name : conventional Version : 1.0.0
Dose Control Mode : High Performance Dose Control
Logfile : LI/LISA/waf.149
Result Table
+----------+-----------------------------------------+-------+--------+--------+
| | Recorded Exposure Energy Dose | | | |
| +----------+--------+----------+----------+ | | |
| Dose | Mean | Stddev | Min | Max |Repeat | Acc | Sum |
| [mJ/cm2] | [mJ/cm2] |[mJ/cm2]| [mJ/cm2] | [mJ/cm2] | [%] | [%] | [%] |
+==========+==========+========+==========+==========+=======+========+========+
| 5.00 | 5.09 | 0.00 | 5.08 | 5.10 | 0.24 | 1.77 | 2.00 |
| 10.00 | 10.21 | 0.01 | 10.19 | 10.23 | 0.22 | 2.07 | 2.29 |
| 20.00 | 20.31 | 0.01 | 20.28 | 20.35 | 0.18 | 1.56 | 1.74 |
| 30.00 | 30.39 | 0.01 | 30.35 | 30.44 | 0.14 | 1.32 | 1.46 |
| 40.00 | 40.54 | 0.02 | 40.50 | 40.59 | 0.11 | 1.35 | 1.45 |
| 50.00 | 50.57 | 0.02 | 50.52 | 50.62 | 0.10 | 1.14 | 1.24 |
| 100.00 | 101.04 | 0.05 | 100.93 | 101.16 | 0.11 | 1.04 | 1.15 |
| 150.00 | 151.39 | 0.08 | 151.27 | 151.55 | 0.09 | 0.93 | 1.02 |
+----------+----------+--------+----------+----------+-------+--------+--------+
Max. Repeatability [%] : 0.24
Min. Repeatability [%] : 0.09
Max. Accuracy [%] : 2.07
Min. Accuracy [%] : 0.93
Max. Sum [%] : 2.31
Min. Sum [%] : 1.02
############################################################################
############################################################################
==============================================================================
Dyn System Qual;Image Plane - ...ification/Dynamic/Single Energy/Model ; Dynamic
Operator:MSA Machine:XXXX Release:8.7.0 Date:11/21/2012 Time:11:27
Exposure conditions:
Exposure date and time : Sun Aug 19 11:46:56 2012
Machine ID : XXXX
Reticle ID : 45441782A019
Reticle Alignment : TTL Align
Lens type : 79
Temperature [degC]: 22.00
Pressure [mbar]: 1023.25
Illumination Mode : Conventional
Blade ID : Not Applicable
Numerical Aperture : 0.57
Sigma Inner : Not Applicable
Sigma Outer : 0.75
Lens ID : 0105624A
Focus Step [um]: 0.12
Focus Offset [um]: -0.90
Number of wafers : 2
Comments:
'Exposure': MPM
'Modelling':
Data File Name: XXXX_MPM8_081912
==============================================================================
Uncorrected values:
+----------------------------------------------------------+
| | Mean | Std. Dev. |
|==========================================================|
| Focus range [nm] | 148 | 20 |
| Raw astigmatism [nm] | 106 | 6 |
+----------------------------------------------------------+
Correctables:
+-------------------------------------------+
| Image offset [um] | 0.049 |
| Image tilt in x (Ry) [urad] | 0.195 |
| Element 1 height [um] | 0.722 |
| | |
| RS linear wedge [urad] | -0.546 |
| RS quadratic wedge [nm/cm2] | -3.749 |
+-------------------------------------------+
Result after corrections:
+----------------------------------------------------------+
| | Mean | Std. Dev. |
|==========================================================|
| Image plane deviation [nm] | 151 | 16 |
| Astigmatism [nm] | 106 | 7 |
+----------------------------------------------------------+
determined on 91 field positions.
############################################################################
############################################################################
Operator:MSA Machine:XXXX Release:8.7.0 Date:08/18/2010 Time:17:42
Focus Reproducibility
Measurements
Position : Wafer
Position X [mm] : 0.00 Y [mm] : 0.00
Number of measurements : 100
Output
Data Type : Full
Configuration
Reference Branch : Y
Fine p : Y q : Y
Window
Height [nm] Coarse : 250 Fine : 250
Tilt [urad] Rx : 100 Ry : 100
Absolute results
+---------+------------+------------+------------+------------+
| | Z | Rx | Ry | TotZ |
| | [um] | [urad] | [urad] | [um] |
+=========+============+============+============+============+
| Avg | -9.7701 | -39.8370 | -38.0575 | -10.5218 |
| Max | -9.7515 | -38.2445 | -36.3055 | -10.4992 |
| Min | -9.7916 | -42.0147 | -39.8978 | -10.5497 |
| Max-Min | 0.0401 | 3.7701 | 3.5923 | 0.0504 |
| Stddev | 0.0079 | 0.6756 | 0.7289 | 0.0125 |
+---------+------------+------------+------------+------------+
Relative results (to average)
+---------+------------+------------+------------+------------+
| | Z | Rx | Ry | TotZ |
| | [um] | [urad] | [urad] | [um] |
+=========+============+============+============+============+
| Avg | 0.0000 | 0.0000 | 0.0000 | 0.0000 |
| Max | 0.0186 | 1.5925 | 1.7521 | 0.0225 |
| Min | -0.0216 | -2.1776 | -1.8402 | -0.0279 |
+---------+------------+------------+------------+------------+
Termination Status
terminated : Normally
error count : 0
Measured data (Absolute)
+------------+------------+------------+------------+
| Z | Rx | Ry | TotZ |
| [um] | [urad] | [urad] | [um] |
+============+============+============+============+
| -9.7655 | -40.5165 | -36.9648 | -10.5074 |
| -9.7800 | -39.5127 | -37.1097 | -10.5173 |
| -9.7769 | -39.7916 | -38.9125 | -10.5394 |
| -9.7790 | -40.3539 | -38.2437 | -10.5364 |
| -9.7785 | -39.5528 | -38.7713 | -10.5377 |
| -9.7649 | -40.4179 | -37.2816 | -10.5102 |
| -9.7732 | -42.0147 | -36.8241 | -10.5229 |
| -9.7821 | -39.0658 | -38.4235 | -10.5336 |
| -9.7652 | -39.7742 | -37.5021 | -10.5093 |
| -9.7684 | -39.3748 | -37.6588 | -10.5119 |
| -9.7652 | -39.5564 | -36.9409 | -10.5006 |
| -9.7634 | -40.8306 | -37.7038 | -10.5169 |
| -9.7515 | -40.6355 | -37.3565 | -10.4992 |
| -9.7603 | -40.2630 | -37.1124 | -10.5025 |
| -9.7786 | -39.3249 | -37.7339 | -10.5227 |
| -9.7643 | -40.6762 | -37.9644 | -10.5202 |
| -9.7675 | -40.4179 | -37.3377 | -10.5136 |
| -9.7776 | -38.8425 | -38.0860 | -10.5232 |
| -9.7718 | -40.2938 | -37.3000 | -10.5166 |
| -9.7681 | -40.0046 | -38.3063 | -10.5241 |
| -9.7748 | -39.3195 | -36.3055 | -10.5004 |
| -9.7667 | -40.5930 | -38.2534 | -10.5258 |
| -9.7868 | -39.8798 | -38.2696 | -10.5415 |
| -9.7745 | -39.9436 | -38.9972 | -10.5391 |
| -9.7645 | -39.8327 | -39.0892 | -10.5296 |
| -9.7701 | -40.2804 | -36.7024 | -10.5070 |
| -9.7814 | -40.2261 | -37.8231 | -10.5325 |
| -9.7794 | -39.8133 | -39.0155 | -10.5434 |
| -9.7750 | -39.0829 | -39.1232 | -10.5357 |
| -9.7797 | -40.6502 | -37.6666 | -10.5315 |
| -9.7672 | -40.4168 | -36.7030 | -10.5050 |
| -9.7761 | -39.1525 | -38.2369 | -10.5258 |
| -9.7870 | -39.0503 | -38.4891 | -10.5392 |
| -9.7577 | -41.1639 | -36.8837 | -10.5027 |
| -9.7570 | -41.1076 | -38.2929 | -10.5199 |
| -9.7714 | -40.7037 | -37.9743 | -10.5276 |
| -9.7568 | -39.8498 | -38.0060 | -10.5080 |
| -9.7710 | -39.3692 | -39.7966 | -10.5423 |
| -9.7646 | -39.8609 | -37.4839 | -10.5090 |
| -9.7721 | -39.6824 | -38.3422 | -10.5265 |
| -9.7604 | -39.2479 | -37.4802 | -10.5008 |
| -9.7536 | -39.2437 | -38.4132 | -10.5061 |
| -9.7657 | -40.2048 | -37.6258 | -10.5141 |
| -9.7762 | -39.6844 | -37.8291 | -10.5239 |
| -9.7702 | -38.8947 | -37.6470 | -10.5105 |
| -9.7612 | -40.1875 | -38.2415 | -10.5176 |
| -9.7792 | -39.8850 | -37.5037 | -10.5240 |
| -9.7729 | -39.1850 | -37.2381 | -10.5098 |
| -9.7613 | -40.7197 | -37.9457 | -10.5173 |
| -9.7705 | -39.9194 | -39.2022 | -10.5376 |
| -9.7564 | -38.9419 | -39.4759 | -10.5207 |
| -9.7694 | -39.1124 | -39.8978 | -10.5404 |
| -9.7720 | -39.1279 | -38.2178 | -10.5212 |
| -9.7916 | -39.8522 | -38.5405 | -10.5497 |
| -9.7741 | -40.0793 | -38.6619 | -10.5352 |
| -9.7691 | -39.9331 | -38.1660 | -10.5228 |
| -9.7792 | -40.3889 | -38.7946 | -10.5440 |
| -9.7717 | -39.1853 | -37.4060 | -10.5107 |
| -9.7745 | -40.9147 | -38.2744 | -10.5360 |
| -9.7732 | -39.6131 | -37.6885 | -10.5187 |
| -9.7787 | -39.9724 | -37.8588 | -10.5287 |
| -9.7762 | -40.0535 | -38.1205 | -10.5301 |
| -9.7629 | -40.5288 | -36.8900 | -10.5039 |
| -9.7702 | -39.5173 | -37.6971 | -10.5151 |
| -9.7761 | -39.9947 | -38.1668 | -10.5303 |
| -9.7680 | -38.8518 | -37.8147 | -10.5102 |
| -9.7658 | -39.8365 | -37.7452 | -10.5134 |
| -9.7689 | -40.1078 | -37.1308 | -10.5103 |
| -9.7742 | -39.4813 | -38.4813 | -10.5291 |
| -9.7727 | -39.9902 | -37.2798 | -10.5153 |
| -9.7634 | -39.8633 | -37.0637 | -10.5023 |
| -9.7711 | -38.2445 | -37.7369 | -10.5083 |
| -9.7732 | -40.2596 | -37.2719 | -10.5174 |
| -9.7761 | -40.3531 | -37.6834 | -10.5262 |
| -9.7766 | -40.0425 | -38.9605 | -10.5413 |
| -9.7674 | -39.8253 | -38.4360 | -10.5239 |
| -9.7772 | -39.5769 | -38.3233 | -10.5307 |
| -9.7698 | -38.7025 | -39.2795 | -10.5301 |
| -9.7688 | -38.7997 | -38.1785 | -10.5153 |
| -9.7768 | -39.4022 | -37.5756 | -10.5194 |
| -9.7820 | -39.3415 | -38.4344 | -10.5354 |
| -9.7578 | -39.4880 | -38.3495 | -10.5110 |
| -9.7767 | -39.9885 | -38.1482 | -10.5306 |
| -9.7615 | -39.7493 | -39.0979 | -10.5262 |
| -9.7602 | -39.8560 | -38.0996 | -10.5126 |
| -9.7674 | -39.6038 | -39.2936 | -10.5336 |
| -9.7559 | -39.3433 | -38.7500 | -10.5134 |
| -9.7652 | -40.7314 | -37.6660 | -10.5176 |
| -9.7556 | -39.0180 | -38.6828 | -10.5101 |
| -9.7736 | -38.5990 | -38.6164 | -10.5246 |
| -9.7659 | -40.0684 | -37.5131 | -10.5120 |
| -9.7717 | -40.3805 | -39.0647 | -10.5400 |
| -9.7767 | -40.0894 | -39.2315 | -10.5453 |
| -9.7738 | -39.3731 | -38.5647 | -10.5291 |
| -9.7687 | -39.5713 | -38.4534 | -10.5238 |
| -9.7522 | -38.9775 | -38.4677 | -10.5037 |
| -9.7614 | -41.1591 | -37.7801 | -10.5180 |
| -9.7636 | -41.2565 | -38.6489 | -10.5321 |
| -9.7665 | -38.2850 | -37.7461 | -10.5041 |
| -9.7770 | -39.8987 | -38.2130 | -10.5312 |
+------------+------------+------------+------------+
############################################################################
############################################################################
Dynamic System Qualification ; Distortion - ...ification/Dynamic/Model ; Dynamic
Operator:ASM Machine:4418 Release:8.8.6 Date:11/26/2012 Time:11:19
System Qualification
Exposure Layer : --- First ---
Date/Time : Sun Aug 19 10:59:23 2012
Machine ID : XXXX
Reticle ID : 45443171A103
Reference Grid :
Matching set ID : NOMINAL
Reticle Alignment : TTL Align
Wafer Alignment : TTL Align
Lens Type : 79
Lens ID : 0105624A
Energy [mJ/cm2] : 33.0
Focus Offset [um] : 0.00
Illumination Mode : Conventional
Blade ID :
Numerical Aperture : 0.57
Sigma Inner :
Sigma Outer : 0.75
Temperature [degC] : 22.0
Pressure [mbar] : 1023.4
Wavelength [nm] : 248.281
Comments from:
'Exposure First Layer' : MPM
'Measure Mark Positions' :
'XY-Imaging Modelling' :
Test Log Name : XYD_XXXX_MPM8_081912.tlg
Optimization Method : Least-Squares
Number of Wafers : 1
Number of Rejected Wafers : 0
Number of Fields per Wafer : 12
Number of Marks per Field : 49
Alignment Errors in Data : 0
Max Field Size X [mm] : 26.0
Y [mm] : 33.0
Wafer/Field/Mark Selection : *:*:*
Align. Errors in Selection : 0
Overlay Mode : First to Nominal
Set Threshold : OFF
Reticle data used : Reticle data from testlog
Reticle layout used : 4X_SU_DYNA_7X7
==============================================================================
Uncorrected values:
+----------------------------------+---------+---------+
| | Mean |Std. Dev.|
| | [nm] | [nm] |
+==================================+=========+=========+
| max. image displacement x | 38.0 | 4.5 |
| max. image displacement y | 37.5 | 7.4 |
+----------------------------------+---------+---------+
Correctables:
+------------------------------+----------+----------+
| | Mean |Std. Dev. |
+==============================+==========+==========+
| RS height [um] | -0.072 | 1.431 |
| RS tilt in x (Ry) [urad] | 216.176 | 32.303 |
| Element 2 height [um] | 0.060 | 0.109 |
| Translation in X [um] | 0.019 | 0.006 |
| Translation in Y [um] | -0.004 | 0.005 |
| Lens rotation [urad] | 0.157 | 0.116 |
| Scan skew [urad] | 0.118 | 0.048 |
| Scan scale [ppm] | 0.225 | 0.200 |
+------------------------------+----------+----------+
Result after corrections:
+----------------------------------+---------+---------+
| | Mean |Std. Dev.|
| | [nm] | [nm] |
+==================================+=========+=========+
| image distortion (NCE) x | 17.2 | 6.7 |
| image distortion (NCE) y | 27.7 | 4.8 |
+----------------------------------+---------+---------+
############################################################################
############################################################################
Model - ...ogy Verification/Overlay/Wafer Stage Accuracy/Dynamic/Single Velocity
Operator:MSA Machine:XXXX Release:8.7.0 Date:05/06/2012 Time:07:12
Wafer Stage Accuracy
Exposure Layer : --- First ---
Date/Time : Sat May 5 17:30:29 2012
Machine ID : XXXX
Reticle ID : 45443171A103
Reference Grid :
Matching set ID : NOMINAL
Reticle Alignment : TTL Align
Wafer Alignment : No Align
Lens Type : 79
Lens ID : 0105624A
Energy [mJ/cm2] : 33.0
Focus Offset [um] : 0.00
Illumination Mode : Conventional
Blade ID :
Numerical Aperture : 0.57
Sigma Inner :
Sigma Outer : 0.75
Temperature [degC] : 22.0
Pressure [mbar] : 1026.9
Wavelength [nm] : 248.278
Comments from:
'Exposure First Layer' : after hp laser replacement
'Measure Mark Positions' :
'XY-Imaging Modelling' :
Test Log Name : XYW_SA_050512.tlg
Optimization Method : Least-Squares
Number of Wafers Measured : 1
Number of Fields per Wafer : 20
Number of Marks per Field : 25
Alignment Errors in Data : 0
Max Field Size X [mm] : 26.0
Y [mm] : 33.0
Wafer/Field/Mark Selection : *:*:*
Align. Errors in Selection : 0
Overlay Mode : Second to First
Set Threshold : OFF
Reticle data used : Reticle data from testlog
==============================================================================
Overlay Error for this Batch:
+------------------+-----------------------------+
| | Filtered Overlay Error |
| +---------+---------+---------+
| | X | Y | Vector |
| | [nm] | [nm] | [nm] |
+==================+=========+=========+=========+
| Mean | -1 | -1 | |
| St. Dev. | 2 | 2 | |
| |Mean| + 3 Sigma | 7 | 7 | |
| Maximum 99.7% | 7 | 7 | 8 |
+------------------+---------+---------+---------+
Intrafield Overlay Error Classification:
+------------------------------+---------------------+---------------------+
| | Model Parameters |Max. Resulting Errors|
| +----------+----------+----------+----------+
| | Mean |Std. Dev. | Mean |Std. Dev. |
| | | | [nm] | [nm] |
+==============================+==========+==========+==========+==========+
| Translation in X [um] | -0.001 | 0.001 | -1 | 1 |
| Translation in Y [um] | -0.001 | 0.002 | -1 | 2 |
| Rotation [urad] | -0.008 | 0.066 | -0 | 1 |
| Magnification [ppm] | -0.029 | 0.086 | -1 | 2 |
| 3rd Order Dist. [nm/cm3] | 0.266 | 1.537 | 1 | 3 |
| Trapezoid in X [um/cm2] | | | | |
| Trapezoid in Y [um/cm2] | | | | |
| 4th Ord. Trap. X [um/cm4] | | | | |
| 4th Ord. Trap. Y [um/cm4] | | | | |
| Asymm. Rotation [um] | 0.009 | 0.062 | 0 | 1 |
| Asymm. Magnification [ppm] | -0.003 | 0.108 | -0 | 2 |
+------------------------------+----------+----------+----------+----------+
Residuals for this batch:
+--------------------+---------+
| | Value |
+====================+=========+
| Residual X [nm] | 1 |
| Residual Y [nm] | 1 |
+--------------------+---------+
Wafer Stage Classification:
+---------------------------+---------+---------+---------+
| | X | Y | Vector |
| | [nm] | [nm] | [nm] |
+===========================+=========+=========+=========+
| Stage Repeatability | 3 | 4 | |
| Stage Accuracy | 7 | 7 | 8 |
+---------------------------+---------+---------+---------+
############################################################################
############################################################################
Model - Metrology Calibration/Machine Matching/Intrafield
Operator:MSA Machine:XXXX Release:8.7.0 Date:09/22/2012 Time:08:52
Machine to Machine Matching
Exposure Layer : --- First --- : --- Second ---
Date/Time : Thu Oct 26 10:52:45 2000 : Sat Sep 22 08:16:35 2012
Machine ID : XXXX : XXXX
Reticle ID : 45441181A015 : 45441181A015
Reference Grid : :
Matching set ID : DEFAULT : ORIGINAL
Reticle Alignment : TTL Align : TTL Align
Wafer Alignment : TTL Align : TTL Align
Lens Type : 79 : 79
Lens ID : 0105624A : 0105624A
Energy [mJ/cm2] : 30.0 : 33.0
Focus Offset [um] : 0.00 : 0.00
Illumination Mode : Default : Conventional
Blade ID : :
Numerical Aperture : 0.57 : 0.57
Sigma Inner : 0.00 :
Sigma Outer : 0.75 : 0.75
Temperature [degC] : 22.0 : 22.0
Pressure [mbar] : 1014.1 : 1021.8
Wavelength [nm] : 248.288 : 248.282
Comments from:
'Exposure First Layer' :
'Exposure Second Layer' :
'Measure Mark Positions' : WPM
'XY-Imaging Modelling' :
Test Log Name : XYM_zmatchbcf09222012.tlg
Optimization Method : Least-Squares
Number of Wafers Measured : 1
Number of Fields per Wafer : 16
Number of Marks per Field : 17
Alignment Errors in Data : 0
Max Field Size X [mm] : 26.0
Y [mm] : 33.0
Wafer/Field/Mark Selection : *:*:*
Align. Errors in Selection : 0
Overlay Mode : Second to First
Set Threshold : OFF
Reticle data used : Reticle data from testlog
==============================================================================
Overlay Error for this Batch:
+------------------+-----------------------------+
| | Filtered Overlay Error |
| +---------+---------+---------+
| | X | Y | Vector |
| | [nm] | [nm] | [nm] |
+==================+=========+=========+=========+
| Mean | 0 | 0 | |
| St. Dev. | 5 | 6 | |
| |Mean| + 3 Sigma | 14 | 18 | |
| Maximum 99.7% | 14 | 21 | 24 |
+------------------+---------+---------+---------+
Maximum Overlay Error positions for this Batch:
+------+---------+---------+---------+-------------------------------+
| | | | |Corresponding Position in Field|
| | | | +---------------+---------------+
| Nr | Max DX | Stdev | DY | X | Y |
| | [nm] | [nm] | [nm] | [mm] | [mm] |
+======+=========+=========+=========+===============+===============+
| 1 | 6 | 3 | 2 | 0.000 | -10.800 |
| 2 | 5 | 4 | 2 | 10.800 | 0.000 |
| 3 | 4 | 4 | 1 | 0.000 | -6.480 |
| 4 | 4 | 2 | 2 | -10.800 | 0.000 |
| 5 | 3 | 5 | 1 | -6.480 | 6.480 |
| 6 | 3 | 6 | 1 | 10.800 | 10.800 |
| 7 | 3 | 5 | 3 | 0.000 |
ASML PAS 5500 / 500 is a wafer stepper used in the semiconductor industry to fabricate integrated circuits. It uses lasers to photolithographically define features on the substrate. The equipment is highly precise and capable of imaging features with a width of up to 0.2 microns. It is built on a rigid frame to ensure minimal distortions and vibrations, making it suitable for precision imaging applications. The system utilizes a F2 laser source which has superior performance compared to conventional argon-ion laser sources. It provides a uniform beam, enabling more precise imaging. The laser is coupled into the unit with the help of an optical path of mirrors and lenses, and an opto-mechanical shutter is used to control the exposure of the wafer. The machine employs a video projection alignment tool (VPAS) for greater accuracy in optical alignment. This asset uses a projection of a grid pattern on the wafer. The alignment sensors detect the position and tilt of the wafer in order to minimize errors. PAS 5500 / 500 also uses two types of injectors to precisely position the wafer and the optics. The mechanical injector is used for larger steps, whereas the piezo injector is used for small steps. The injectors are integrated with a motorized rotation stage which ensures accurate rotational movements. ASML PAS 5500 / 500 uses a linear drive model to move in the XY direction. It consists of a position encoder, motor and a step motor. The equipment also features several optical elements which assist in the imaging process. These include a microscope, a reflector, an iris, and a condenser. The system utilizes a well-defined stepper algorithm for the imaging process. This includes setting the exposure time, dosage, and repeat count. The repeat count determines the number of times the pattern is imaged on the wafer. This feature, along with the end-of-scan recognition unit, enable precise imaging and optimized throughput. The machine is integrated with Automated Photomask Creation (APC) software which assists in the mask generation process. It includes features such as mask alignment, die registration, and OPC. Overall, PAS 5500 / 500 is a highly precise and automated wafer stepper tool used in semiconductor fabrication. It utilizes advanced features such as an F2 laser source, VPAS for optical alignment, and APC software, for superior imaging performance.
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