Used ASML PAS 5500 / 500 #9049994 for sale

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Manufacturer
ASML
Model
PAS 5500 / 500
ID: 9049994
Stepper with DNS tracks Slit Uniformity Operator:MSA Machine:XXXX Release:8.7.0 Date:09/05/2012 Time:18:01 Comment : Measurement mode Scanning : N Start position : Leftside Measurement settings Fieldsize [mm] X : 26.000 Y : 11.940 Steps X : 11 Y : 51 Number of Pulses : 100 Pulse Frequency [Hz] : 1000 Pulse Energy [mJ] : 10.00 Miscellaneous Apply REMA Window : Yes Illumination Mode Illumination Mode : Conventional Numerical Aperture : 0.57 Sigma Outer : 0.750 Illumination mode name : conventional Version : 1.0.0 Uniformity Measurement Results Uniformity [%] : 0.48 X-Tilt [%/field] : -1.08 Symmetrical error [%] : -0.14 Logfile : LI/LISU/waf.1225 Overall Average of Ratio : 1.00 Standard Deviation : 0.00 Intensities Spot Sensor [mW/cm2] : 585.60 Standard Deviation : 1.90 Intensities Energy Sensor [mW/cm2] : 586.80 Standard Deviation : 0.17 Estimated Uniformity from measured data [%] If corrected for actual tilt : 0.21 If corrected with gradient filter : 0.48 If corrected for tilt and with gradientfilter : 0.07 ############################################################################ ############################################################################ Slit Uniformity Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:09:02 Comment : Annular Measurement mode Scanning : N Start position : Leftside Measurement settings Fieldsize [mm] X : 26.000 Y : 11.940 Steps X : 11 Y : 51 Number of Pulses : 100 Pulse Frequency [Hz] : 1000 Pulse Energy [mJ] : 10.00 Miscellaneous Apply REMA Window : Yes Illumination Mode Illumination Mode : Annular Numerical Aperture : 0.57 Sigma Outer : 0.750 Inner : 0.450 Illumination mode name : annular Version : 1.0.0 Uniformity Measurement Results Uniformity [%] : 0.90 X-Tilt [%/field] : -1.75 Symmetrical error [%] : -0.37 Logfile : LI/LISU/waf.1224 Overall Average of Ratio : 1.00 Standard Deviation : 0.01 Intensities Spot Sensor [mW/cm2] : 605.13 Standard Deviation : 3.65 Intensities Energy Sensor [mW/cm2] : 606.53 Standard Deviation : 0.12 Estimated Uniformity from measured data [%] If corrected for actual tilt : 0.42 If corrected with gradient filter : 0.81 If corrected for tilt and with gradientfilter : 0.08 ############################################################################ ############################################################################ Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:10:38 Uniformity Measurement Comment : Image Field Size [mm] x : 26.0 y : 3.0 Diameter : 40.0 Steps x : 11 y : 3 Measurement Type : Pulse Mode Pulses : 100 Pulse Frequency [Hz] : 1000 Pulse Energy [mJ] : 10.00 Apply REMA Window : Yes Load Reticle : N Illumination Mode : Conventional Numerical Aperture : 0.57 Sigma Outer : 0.750 Illumination mode name : conventional Version : 1.0.0 Uniformity Measurement Result Uniformity [%] : 0.61 Logfile : LI/LIUM/waf.1443 Tilt X [%/field] : -0.91 Y [%/field] : -0.03 Overall Average of Ratio : 1.00 Standard Deviation : 0.00 Intensities Spot Sensor [mW/cm2] : 586.44 Standard Deviation : 1.93 Intensities Energy Sensor [mW/cm2] : 587.55 Standard Deviation : 0.38 Estimated Uniformity from measured data [%] If corrected for actual tilts : 0.37 If corrected with gradient filter : 0.45 If corrected for tilts and with gradientfilter : 0.26 Total Nr of Laserpulses since Installation [* 10^6] : 12454.98 Symmetric Uniformity Value [%] : 0.12 ############################################################################ ############################################################################ Scanning Dose Accuracy & Repeatability Test Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:09:19 Comment : Scanning : Y Scan Direction : Forwards Scan Type Settings : All scans SingleScan Die size [mm] X : 2.000 Y : 5.000 Spot Sensor Coordinates on Die [mm] X : 0.000 Y : -2.000 Rema Mode : Die Number of Repeats for each dose: : 100 Illumination Mode Illumination Mode : Conventional Numerical Aperture : 0.57 Sigma Outer : 0.750 Illumination mode name : conventional Version : 1.0.0 Dose Control Mode : High Performance Dose Control Logfile : LI/LISA/waf.149 Result Table +----------+-----------------------------------------+-------+--------+--------+ | | Recorded Exposure Energy Dose | | | | | +----------+--------+----------+----------+ | | | | Dose | Mean | Stddev | Min | Max |Repeat | Acc | Sum | | [mJ/cm2] | [mJ/cm2] |[mJ/cm2]| [mJ/cm2] | [mJ/cm2] | [%] | [%] | [%] | +==========+==========+========+==========+==========+=======+========+========+ | 5.00 | 5.09 | 0.00 | 5.08 | 5.10 | 0.24 | 1.77 | 2.00 | | 10.00 | 10.21 | 0.01 | 10.19 | 10.23 | 0.22 | 2.07 | 2.29 | | 20.00 | 20.31 | 0.01 | 20.28 | 20.35 | 0.18 | 1.56 | 1.74 | | 30.00 | 30.39 | 0.01 | 30.35 | 30.44 | 0.14 | 1.32 | 1.46 | | 40.00 | 40.54 | 0.02 | 40.50 | 40.59 | 0.11 | 1.35 | 1.45 | | 50.00 | 50.57 | 0.02 | 50.52 | 50.62 | 0.10 | 1.14 | 1.24 | | 100.00 | 101.04 | 0.05 | 100.93 | 101.16 | 0.11 | 1.04 | 1.15 | | 150.00 | 151.39 | 0.08 | 151.27 | 151.55 | 0.09 | 0.93 | 1.02 | +----------+----------+--------+----------+----------+-------+--------+--------+ Max. Repeatability [%] : 0.24 Min. Repeatability [%] : 0.09 Max. Accuracy [%] : 2.07 Min. Accuracy [%] : 0.93 Max. Sum [%] : 2.31 Min. Sum [%] : 1.02 ############################################################################ ############################################################################ ============================================================================== Dyn System Qual;Image Plane - ...ification/Dynamic/Single Energy/Model ; Dynamic Operator:MSA Machine:XXXX Release:8.7.0 Date:11/21/2012 Time:11:27 Exposure conditions: Exposure date and time : Sun Aug 19 11:46:56 2012 Machine ID : XXXX Reticle ID : 45441782A019 Reticle Alignment : TTL Align Lens type : 79 Temperature [degC]: 22.00 Pressure [mbar]: 1023.25 Illumination Mode : Conventional Blade ID : Not Applicable Numerical Aperture : 0.57 Sigma Inner : Not Applicable Sigma Outer : 0.75 Lens ID : 0105624A Focus Step [um]: 0.12 Focus Offset [um]: -0.90 Number of wafers : 2 Comments: 'Exposure': MPM 'Modelling': Data File Name: XXXX_MPM8_081912 ============================================================================== Uncorrected values: +----------------------------------------------------------+ | | Mean | Std. Dev. | |==========================================================| | Focus range [nm] | 148 | 20 | | Raw astigmatism [nm] | 106 | 6 | +----------------------------------------------------------+ Correctables: +-------------------------------------------+ | Image offset [um] | 0.049 | | Image tilt in x (Ry) [urad] | 0.195 | | Element 1 height [um] | 0.722 | | | | | RS linear wedge [urad] | -0.546 | | RS quadratic wedge [nm/cm2] | -3.749 | +-------------------------------------------+ Result after corrections: +----------------------------------------------------------+ | | Mean | Std. Dev. | |==========================================================| | Image plane deviation [nm] | 151 | 16 | | Astigmatism [nm] | 106 | 7 | +----------------------------------------------------------+ determined on 91 field positions. ############################################################################ ############################################################################ Operator:MSA Machine:XXXX Release:8.7.0 Date:08/18/2010 Time:17:42 Focus Reproducibility Measurements Position : Wafer Position X [mm] : 0.00 Y [mm] : 0.00 Number of measurements : 100 Output Data Type : Full Configuration Reference Branch : Y Fine p : Y q : Y Window Height [nm] Coarse : 250 Fine : 250 Tilt [urad] Rx : 100 Ry : 100 Absolute results +---------+------------+------------+------------+------------+ | | Z | Rx | Ry | TotZ | | | [um] | [urad] | [urad] | [um] | +=========+============+============+============+============+ | Avg | -9.7701 | -39.8370 | -38.0575 | -10.5218 | | Max | -9.7515 | -38.2445 | -36.3055 | -10.4992 | | Min | -9.7916 | -42.0147 | -39.8978 | -10.5497 | | Max-Min | 0.0401 | 3.7701 | 3.5923 | 0.0504 | | Stddev | 0.0079 | 0.6756 | 0.7289 | 0.0125 | +---------+------------+------------+------------+------------+ Relative results (to average) +---------+------------+------------+------------+------------+ | | Z | Rx | Ry | TotZ | | | [um] | [urad] | [urad] | [um] | +=========+============+============+============+============+ | Avg | 0.0000 | 0.0000 | 0.0000 | 0.0000 | | Max | 0.0186 | 1.5925 | 1.7521 | 0.0225 | | Min | -0.0216 | -2.1776 | -1.8402 | -0.0279 | +---------+------------+------------+------------+------------+ Termination Status terminated : Normally error count : 0 Measured data (Absolute) +------------+------------+------------+------------+ | Z | Rx | Ry | TotZ | | [um] | [urad] | [urad] | [um] | +============+============+============+============+ | -9.7655 | -40.5165 | -36.9648 | -10.5074 | | -9.7800 | -39.5127 | -37.1097 | -10.5173 | | -9.7769 | -39.7916 | -38.9125 | -10.5394 | | -9.7790 | -40.3539 | -38.2437 | -10.5364 | | -9.7785 | -39.5528 | -38.7713 | -10.5377 | | -9.7649 | -40.4179 | -37.2816 | -10.5102 | | -9.7732 | -42.0147 | -36.8241 | -10.5229 | | -9.7821 | -39.0658 | -38.4235 | -10.5336 | | -9.7652 | -39.7742 | -37.5021 | -10.5093 | | -9.7684 | -39.3748 | -37.6588 | -10.5119 | | -9.7652 | -39.5564 | -36.9409 | -10.5006 | | -9.7634 | -40.8306 | -37.7038 | -10.5169 | | -9.7515 | -40.6355 | -37.3565 | -10.4992 | | -9.7603 | -40.2630 | -37.1124 | -10.5025 | | -9.7786 | -39.3249 | -37.7339 | -10.5227 | | -9.7643 | -40.6762 | -37.9644 | -10.5202 | | -9.7675 | -40.4179 | -37.3377 | -10.5136 | | -9.7776 | -38.8425 | -38.0860 | -10.5232 | | -9.7718 | -40.2938 | -37.3000 | -10.5166 | | -9.7681 | -40.0046 | -38.3063 | -10.5241 | | -9.7748 | -39.3195 | -36.3055 | -10.5004 | | -9.7667 | -40.5930 | -38.2534 | -10.5258 | | -9.7868 | -39.8798 | -38.2696 | -10.5415 | | -9.7745 | -39.9436 | -38.9972 | -10.5391 | | -9.7645 | -39.8327 | -39.0892 | -10.5296 | | -9.7701 | -40.2804 | -36.7024 | -10.5070 | | -9.7814 | -40.2261 | -37.8231 | -10.5325 | | -9.7794 | -39.8133 | -39.0155 | -10.5434 | | -9.7750 | -39.0829 | -39.1232 | -10.5357 | | -9.7797 | -40.6502 | -37.6666 | -10.5315 | | -9.7672 | -40.4168 | -36.7030 | -10.5050 | | -9.7761 | -39.1525 | -38.2369 | -10.5258 | | -9.7870 | -39.0503 | -38.4891 | -10.5392 | | -9.7577 | -41.1639 | -36.8837 | -10.5027 | | -9.7570 | -41.1076 | -38.2929 | -10.5199 | | -9.7714 | -40.7037 | -37.9743 | -10.5276 | | -9.7568 | -39.8498 | -38.0060 | -10.5080 | | -9.7710 | -39.3692 | -39.7966 | -10.5423 | | -9.7646 | -39.8609 | -37.4839 | -10.5090 | | -9.7721 | -39.6824 | -38.3422 | -10.5265 | | -9.7604 | -39.2479 | -37.4802 | -10.5008 | | -9.7536 | -39.2437 | -38.4132 | -10.5061 | | -9.7657 | -40.2048 | -37.6258 | -10.5141 | | -9.7762 | -39.6844 | -37.8291 | -10.5239 | | -9.7702 | -38.8947 | -37.6470 | -10.5105 | | -9.7612 | -40.1875 | -38.2415 | -10.5176 | | -9.7792 | -39.8850 | -37.5037 | -10.5240 | | -9.7729 | -39.1850 | -37.2381 | -10.5098 | | -9.7613 | -40.7197 | -37.9457 | -10.5173 | | -9.7705 | -39.9194 | -39.2022 | -10.5376 | | -9.7564 | -38.9419 | -39.4759 | -10.5207 | | -9.7694 | -39.1124 | -39.8978 | -10.5404 | | -9.7720 | -39.1279 | -38.2178 | -10.5212 | | -9.7916 | -39.8522 | -38.5405 | -10.5497 | | -9.7741 | -40.0793 | -38.6619 | -10.5352 | | -9.7691 | -39.9331 | -38.1660 | -10.5228 | | -9.7792 | -40.3889 | -38.7946 | -10.5440 | | -9.7717 | -39.1853 | -37.4060 | -10.5107 | | -9.7745 | -40.9147 | -38.2744 | -10.5360 | | -9.7732 | -39.6131 | -37.6885 | -10.5187 | | -9.7787 | -39.9724 | -37.8588 | -10.5287 | | -9.7762 | -40.0535 | -38.1205 | -10.5301 | | -9.7629 | -40.5288 | -36.8900 | -10.5039 | | -9.7702 | -39.5173 | -37.6971 | -10.5151 | | -9.7761 | -39.9947 | -38.1668 | -10.5303 | | -9.7680 | -38.8518 | -37.8147 | -10.5102 | | -9.7658 | -39.8365 | -37.7452 | -10.5134 | | -9.7689 | -40.1078 | -37.1308 | -10.5103 | | -9.7742 | -39.4813 | -38.4813 | -10.5291 | | -9.7727 | -39.9902 | -37.2798 | -10.5153 | | -9.7634 | -39.8633 | -37.0637 | -10.5023 | | -9.7711 | -38.2445 | -37.7369 | -10.5083 | | -9.7732 | -40.2596 | -37.2719 | -10.5174 | | -9.7761 | -40.3531 | -37.6834 | -10.5262 | | -9.7766 | -40.0425 | -38.9605 | -10.5413 | | -9.7674 | -39.8253 | -38.4360 | -10.5239 | | -9.7772 | -39.5769 | -38.3233 | -10.5307 | | -9.7698 | -38.7025 | -39.2795 | -10.5301 | | -9.7688 | -38.7997 | -38.1785 | -10.5153 | | -9.7768 | -39.4022 | -37.5756 | -10.5194 | | -9.7820 | -39.3415 | -38.4344 | -10.5354 | | -9.7578 | -39.4880 | -38.3495 | -10.5110 | | -9.7767 | -39.9885 | -38.1482 | -10.5306 | | -9.7615 | -39.7493 | -39.0979 | -10.5262 | | -9.7602 | -39.8560 | -38.0996 | -10.5126 | | -9.7674 | -39.6038 | -39.2936 | -10.5336 | | -9.7559 | -39.3433 | -38.7500 | -10.5134 | | -9.7652 | -40.7314 | -37.6660 | -10.5176 | | -9.7556 | -39.0180 | -38.6828 | -10.5101 | | -9.7736 | -38.5990 | -38.6164 | -10.5246 | | -9.7659 | -40.0684 | -37.5131 | -10.5120 | | -9.7717 | -40.3805 | -39.0647 | -10.5400 | | -9.7767 | -40.0894 | -39.2315 | -10.5453 | | -9.7738 | -39.3731 | -38.5647 | -10.5291 | | -9.7687 | -39.5713 | -38.4534 | -10.5238 | | -9.7522 | -38.9775 | -38.4677 | -10.5037 | | -9.7614 | -41.1591 | -37.7801 | -10.5180 | | -9.7636 | -41.2565 | -38.6489 | -10.5321 | | -9.7665 | -38.2850 | -37.7461 | -10.5041 | | -9.7770 | -39.8987 | -38.2130 | -10.5312 | +------------+------------+------------+------------+ ############################################################################ ############################################################################ Dynamic System Qualification ; Distortion - ...ification/Dynamic/Model ; Dynamic Operator:ASM Machine:4418 Release:8.8.6 Date:11/26/2012 Time:11:19 System Qualification Exposure Layer : --- First --- Date/Time : Sun Aug 19 10:59:23 2012 Machine ID : XXXX Reticle ID : 45443171A103 Reference Grid : Matching set ID : NOMINAL Reticle Alignment : TTL Align Wafer Alignment : TTL Align Lens Type : 79 Lens ID : 0105624A Energy [mJ/cm2] : 33.0 Focus Offset [um] : 0.00 Illumination Mode : Conventional Blade ID : Numerical Aperture : 0.57 Sigma Inner : Sigma Outer : 0.75 Temperature [degC] : 22.0 Pressure [mbar] : 1023.4 Wavelength [nm] : 248.281 Comments from: 'Exposure First Layer' : MPM 'Measure Mark Positions' : 'XY-Imaging Modelling' : Test Log Name : XYD_XXXX_MPM8_081912.tlg Optimization Method : Least-Squares Number of Wafers : 1 Number of Rejected Wafers : 0 Number of Fields per Wafer : 12 Number of Marks per Field : 49 Alignment Errors in Data : 0 Max Field Size X [mm] : 26.0 Y [mm] : 33.0 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : First to Nominal Set Threshold : OFF Reticle data used : Reticle data from testlog Reticle layout used : 4X_SU_DYNA_7X7 ============================================================================== Uncorrected values: +----------------------------------+---------+---------+ | | Mean |Std. Dev.| | | [nm] | [nm] | +==================================+=========+=========+ | max. image displacement x | 38.0 | 4.5 | | max. image displacement y | 37.5 | 7.4 | +----------------------------------+---------+---------+ Correctables: +------------------------------+----------+----------+ | | Mean |Std. Dev. | +==============================+==========+==========+ | RS height [um] | -0.072 | 1.431 | | RS tilt in x (Ry) [urad] | 216.176 | 32.303 | | Element 2 height [um] | 0.060 | 0.109 | | Translation in X [um] | 0.019 | 0.006 | | Translation in Y [um] | -0.004 | 0.005 | | Lens rotation [urad] | 0.157 | 0.116 | | Scan skew [urad] | 0.118 | 0.048 | | Scan scale [ppm] | 0.225 | 0.200 | +------------------------------+----------+----------+ Result after corrections: +----------------------------------+---------+---------+ | | Mean |Std. Dev.| | | [nm] | [nm] | +==================================+=========+=========+ | image distortion (NCE) x | 17.2 | 6.7 | | image distortion (NCE) y | 27.7 | 4.8 | +----------------------------------+---------+---------+ ############################################################################ ############################################################################ Model - ...ogy Verification/Overlay/Wafer Stage Accuracy/Dynamic/Single Velocity Operator:MSA Machine:XXXX Release:8.7.0 Date:05/06/2012 Time:07:12 Wafer Stage Accuracy Exposure Layer : --- First --- Date/Time : Sat May 5 17:30:29 2012 Machine ID : XXXX Reticle ID : 45443171A103 Reference Grid : Matching set ID : NOMINAL Reticle Alignment : TTL Align Wafer Alignment : No Align Lens Type : 79 Lens ID : 0105624A Energy [mJ/cm2] : 33.0 Focus Offset [um] : 0.00 Illumination Mode : Conventional Blade ID : Numerical Aperture : 0.57 Sigma Inner : Sigma Outer : 0.75 Temperature [degC] : 22.0 Pressure [mbar] : 1026.9 Wavelength [nm] : 248.278 Comments from: 'Exposure First Layer' : after hp laser replacement 'Measure Mark Positions' : 'XY-Imaging Modelling' : Test Log Name : XYW_SA_050512.tlg Optimization Method : Least-Squares Number of Wafers Measured : 1 Number of Fields per Wafer : 20 Number of Marks per Field : 25 Alignment Errors in Data : 0 Max Field Size X [mm] : 26.0 Y [mm] : 33.0 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : Second to First Set Threshold : OFF Reticle data used : Reticle data from testlog ============================================================================== Overlay Error for this Batch: +------------------+-----------------------------+ | | Filtered Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | -1 | -1 | | | St. Dev. | 2 | 2 | | | |Mean| + 3 Sigma | 7 | 7 | | | Maximum 99.7% | 7 | 7 | 8 | +------------------+---------+---------+---------+ Intrafield Overlay Error Classification: +------------------------------+---------------------+---------------------+ | | Model Parameters |Max. Resulting Errors| | +----------+----------+----------+----------+ | | Mean |Std. Dev. | Mean |Std. Dev. | | | | | [nm] | [nm] | +==============================+==========+==========+==========+==========+ | Translation in X [um] | -0.001 | 0.001 | -1 | 1 | | Translation in Y [um] | -0.001 | 0.002 | -1 | 2 | | Rotation [urad] | -0.008 | 0.066 | -0 | 1 | | Magnification [ppm] | -0.029 | 0.086 | -1 | 2 | | 3rd Order Dist. [nm/cm3] | 0.266 | 1.537 | 1 | 3 | | Trapezoid in X [um/cm2] | | | | | | Trapezoid in Y [um/cm2] | | | | | | 4th Ord. Trap. X [um/cm4] | | | | | | 4th Ord. Trap. Y [um/cm4] | | | | | | Asymm. Rotation [um] | 0.009 | 0.062 | 0 | 1 | | Asymm. Magnification [ppm] | -0.003 | 0.108 | -0 | 2 | +------------------------------+----------+----------+----------+----------+ Residuals for this batch: +--------------------+---------+ | | Value | +====================+=========+ | Residual X [nm] | 1 | | Residual Y [nm] | 1 | +--------------------+---------+ Wafer Stage Classification: +---------------------------+---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +===========================+=========+=========+=========+ | Stage Repeatability | 3 | 4 | | | Stage Accuracy | 7 | 7 | 8 | +---------------------------+---------+---------+---------+ ############################################################################ ############################################################################ Model - Metrology Calibration/Machine Matching/Intrafield Operator:MSA Machine:XXXX Release:8.7.0 Date:09/22/2012 Time:08:52 Machine to Machine Matching Exposure Layer : --- First --- : --- Second --- Date/Time : Thu Oct 26 10:52:45 2000 : Sat Sep 22 08:16:35 2012 Machine ID : XXXX : XXXX Reticle ID : 45441181A015 : 45441181A015 Reference Grid : : Matching set ID : DEFAULT : ORIGINAL Reticle Alignment : TTL Align : TTL Align Wafer Alignment : TTL Align : TTL Align Lens Type : 79 : 79 Lens ID : 0105624A : 0105624A Energy [mJ/cm2] : 30.0 : 33.0 Focus Offset [um] : 0.00 : 0.00 Illumination Mode : Default : Conventional Blade ID : : Numerical Aperture : 0.57 : 0.57 Sigma Inner : 0.00 : Sigma Outer : 0.75 : 0.75 Temperature [degC] : 22.0 : 22.0 Pressure [mbar] : 1014.1 : 1021.8 Wavelength [nm] : 248.288 : 248.282 Comments from: 'Exposure First Layer' : 'Exposure Second Layer' : 'Measure Mark Positions' : WPM 'XY-Imaging Modelling' : Test Log Name : XYM_zmatchbcf09222012.tlg Optimization Method : Least-Squares Number of Wafers Measured : 1 Number of Fields per Wafer : 16 Number of Marks per Field : 17 Alignment Errors in Data : 0 Max Field Size X [mm] : 26.0 Y [mm] : 33.0 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : Second to First Set Threshold : OFF Reticle data used : Reticle data from testlog ============================================================================== Overlay Error for this Batch: +------------------+-----------------------------+ | | Filtered Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | 0 | 0 | | | St. Dev. | 5 | 6 | | | |Mean| + 3 Sigma | 14 | 18 | | | Maximum 99.7% | 14 | 21 | 24 | +------------------+---------+---------+---------+ Maximum Overlay Error positions for this Batch: +------+---------+---------+---------+-------------------------------+ | | | | |Corresponding Position in Field| | | | | +---------------+---------------+ | Nr | Max DX | Stdev | DY | X | Y | | | [nm] | [nm] | [nm] | [mm] | [mm] | +======+=========+=========+=========+===============+===============+ | 1 | 6 | 3 | 2 | 0.000 | -10.800 | | 2 | 5 | 4 | 2 | 10.800 | 0.000 | | 3 | 4 | 4 | 1 | 0.000 | -6.480 | | 4 | 4 | 2 | 2 | -10.800 | 0.000 | | 5 | 3 | 5 | 1 | -6.480 | 6.480 | | 6 | 3 | 6 | 1 | 10.800 | 10.800 | | 7 | 3 | 5 | 3 | 0.000 |
ASML PAS 5500 / 500 is a wafer stepper used in the semiconductor industry to fabricate integrated circuits. It uses lasers to photolithographically define features on the substrate. The equipment is highly precise and capable of imaging features with a width of up to 0.2 microns. It is built on a rigid frame to ensure minimal distortions and vibrations, making it suitable for precision imaging applications. The system utilizes a F2 laser source which has superior performance compared to conventional argon-ion laser sources. It provides a uniform beam, enabling more precise imaging. The laser is coupled into the unit with the help of an optical path of mirrors and lenses, and an opto-mechanical shutter is used to control the exposure of the wafer. The machine employs a video projection alignment tool (VPAS) for greater accuracy in optical alignment. This asset uses a projection of a grid pattern on the wafer. The alignment sensors detect the position and tilt of the wafer in order to minimize errors. PAS 5500 / 500 also uses two types of injectors to precisely position the wafer and the optics. The mechanical injector is used for larger steps, whereas the piezo injector is used for small steps. The injectors are integrated with a motorized rotation stage which ensures accurate rotational movements. ASML PAS 5500 / 500 uses a linear drive model to move in the XY direction. It consists of a position encoder, motor and a step motor. The equipment also features several optical elements which assist in the imaging process. These include a microscope, a reflector, an iris, and a condenser. The system utilizes a well-defined stepper algorithm for the imaging process. This includes setting the exposure time, dosage, and repeat count. The repeat count determines the number of times the pattern is imaged on the wafer. This feature, along with the end-of-scan recognition unit, enable precise imaging and optimized throughput. The machine is integrated with Automated Photomask Creation (APC) software which assists in the mask generation process. It includes features such as mask alignment, die registration, and OPC. Overall, PAS 5500 / 500 is a highly precise and automated wafer stepper tool used in semiconductor fabrication. It utilizes advanced features such as an F2 laser source, VPAS for optical alignment, and APC software, for superior imaging performance.
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