Used ASML PAS 5500 / 60 #293817857 for sale

ASML PAS 5500 / 60
Manufacturer
ASML
Model
PAS 5500 / 60
ID: 293817857
i-Line Stepper Numerical Aperture (NA): 0.54 Resolution: 450 nm DCO: 85 Throughput (WPH): 56.
ASML PAS 5500 / 60 is an advanced lithography tool used in the production of semiconductor wafers. It is an immersion lithography equipment, which takes advantage of the greater refraction index of water compared to air to enable increased resolution at the same numerical aperture beam. ASML PAS 5500/60 system features a sophisticated integrated staging and control unit designed to increase accuracy and throughput, allowing for reliable and effective high-precision lithography required in the semiconductor industry. PAS 5500 / 60 is capable of producing wafers at resolutions of 0.35 micron for a 70nm technology node, and 0.5 micron for a 90nm node. PAS 5500/60 includes a variable-power laser light source that enables a wide range of intensities and wavelengths (359nm - 451nm) to account for a variety of materials used in semiconductor processes. The light is focused to a smaller spot size (<1μm) onto the wafer's surface as a part of the 'pixel' feature pattern. The machine supports both annular and off-axis illumination types, allowing it to be used to produce a choice of array architectures. ASML PAS 5500 / 60 wafer stepper also features an integrated digital controller that precisely drives the wafer chuck, allowing for highly accurate and repeatable positioning for each exposure. The chuck is designed to support up to four plates simultaneously, allowing for multiple-layer fields to be exposed using a single move. The secondary stage quickly exposes the rest of the field in a precise, controlled manner. The tool also features automatic alignments, allowing for precise and readable alignment between multiple layers with the use of a CCD camera. The control tool allows for precise control of exposures and other settings, as well as for off-chuck displacement sensing for accurate measurements of the field size and positioning. Various software supports the asset, including but not limited to emulators, autofocus software and noise reduction software. In addition, ASML provides a variety of services related to ASML PAS 5500/60. This includes preventive maintenance intervals, real-time monitoring and diagnostics, remote support and assessment services, calibration services, model upgrades and software extensions as well as in-depth training. PAS 5500 / 60 is an advanced lithography tool that is capable of producing wafers at resolutions of up to 0.35 microns. It is equipped with a digital controller that precisely drives the wafer chuck, allowing for precise and repeatable positioning for each exposure. It is also equipped with a variable-power laser light source supporting multiple illumination types, an integrated alignment equipment and various software supports. This combination of features and services makes PAS 5500/60 an ideal tool for semiconductor production.
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