Used ASML PAS 5500 / 700B #293817853 for sale

ASML PAS 5500 / 700B wafer stepper is a high precision lithography tool used in semiconductor device fabrication. PAS 5500 / 700B incorporates high-end optics, design features, and specialized software to accurately pattern the design layer on a silicon wafer with a resolution down to 0.33 microns. The equipment is based on the industry standard step-and-repeat align and expose lithographic process. The optical column uses alternating-aperture relay optics technology which maximizes image resolution while minimizing distortion caused by effect of off-axis light. The system is equipped with 4-channel segments (4Cs) unit to enable exposure of features at different focal location on the wafer. This allows the machine to focus light more accurately and resulting in higher resolution in an oblique direction. The scanner motor, which is the primary component in the tool, is highly advanced and accurately control the X-Y linear motion of the wafer. It has high speed for quick exposure and high accuracy for precise exposure while controlling vibration and jitter. The stepper also includes several subsystems components including the illumination asset, reticle stage, wafer chuck, imaging lens, and image control unit. The illumination model contains a respective set of display lamps, condensers and slit lamps. Using specialized software, these components are used to provide the precise exposure of the design layers. The reticle stage is a 6 degrees of freedom stage used to move the mask in the correct direction and alignment and onto the focal plane to improve resolution. The wafer chuck is responsible for maintaining the focus and flatness of the wafer surface to ensure the accurate distribution of light during emission. The imaging lens is built with specialized materials to transmit the image onto the mask. It contains a aberration correction equipment to ensure low distortion. Lastly, the image control unit (ICU) is responsible for controlling the overall exposure time and conditions to ensure the accurate exposure of the wafer. All these components work together to ensure repeat exposure of high-resolution images on the wafer. With its high-end technology, ASML PAS 5500 / 700B is ideal for chip manufacturers to enable the production of high-performing components.