Used ASML PAS 5500 / 750 #9194126 for sale
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ID: 9194126
Wafer Size: 8"
Vintage: 2000
DUV Scanner, 8"
248 nm
SCR Rack:
Current amplifier CPU board TCS3x mater
TC3X Current amplifier
(6) Boards / +5 V PSU /+24 V PSU
AAR Rack:
Power supply boards
CPU
Optical & analog demodulators boards
CSU Rack
RRR Rack
WHR Rack
LPR Rack
WPR Rack: PSDC 48 V
MSR Rack:
Power supplies 5 V & 7 V/LS
AL Hinds controllers
RMR Rack:
Velocity drive digital
Sensor board
Z Sensor analog & digital boards
IL Rack:
Illumination interface board
PID 2,4,5 Boards
Power amplifier board
Level master board
PTI Board
ARMS Rack:
Library card 1
Remote reset
CPU
Wafer handling module:
Gripper unit
Pre-alignment unit
Discharge unit
Input pedestal
Dipod unit
Switch clamp valve
Reticle handling module:
(3) Libraries
Upper & lower robot
Illumination module:
Doe exchanger
ACL Board
BMU
Beam stearing
LSI Board
AIR Mount module:
(3) Servo valves Tc3x block
Geophones
Pre amp boards on AM
WS Module:
(2) Air bearings
Short-long stroke decoupling block
Air bearing controllers
HP Receivers
Flax cable fiber optics
Alignment module:
TTL Laser
OA Red & green laser
Power supply red & green laser
OA CCD CAM
Temperature conditioning module:
C&T Unit & controller
Exhaust fan
ACC Fan & controller
CYMER Laser 61433
Laser 1A8B
Tool model: ELS-6600
LNM
WCM
MCS Board
TCS Board
Exhaust vacuum sensor
Missing parts:
Computer system:
Sun station assembled ultra 10
CRT Monitor
Mouse trackball
2000 vintage.
ASML PAS 5500 / 750 is an advanced simulation lithography tool used by semiconductor manufacturers to produce complex patterns on the surface of silicon wafers and other materials. This equipment is a full semiconductor wafer stepper solution, offering throughput, precision, and accuracy far superior to competing solutions. The system features an integrated dual-axis (XY) Subfield Aligner unit, a Subfield Aberration Correction machine, and a Variable Spot Scanner for beam delivery. The Subfield Aligner tool allows for precise alignment of the desired pattern on the wafer regardless of grain size or any other irregularities. This asset tops off at +/-200nm absolute stepper micro-nudge accuracy. After going through the Subfield Aligner model, the wafer goes through the Subfield Aberration Correction equipment to automatically correct for aberrations introduced during the wafer processing and writing stages. This system is also capable of compensating for much of the lithographic distortion induced by the wafer material. Finally the wafer goes through the Variable Spot Scanner which utilizes an advanced electrical focus-control parameter optimization algorithm to offer unparalleled beam delivery accuracy for all kind of wafers. This unit also features a Dual-Beam Jetting technology to help achieve optimal exposure time and intensity performance. In addition, this machine is capable of doing 5500 exposures per hour, while remaining very energy efficient and quiet during operation. To top it off, PAS 5500 / 750 is modular in design, which means it can be adapted to meet any production need with the latest components and features. Furthermore, the tool is compatible with most popular software platforms and is highly configurable, making it suitable for high-end production settings as well as lower cost laboratories. Overall, ASML PAS 5500 / 750 is an all-in-one wafer stepper solution capable of producing very precise patterns on all kinds of material surfaces. Its powerful components and features make it one of the most advanced simulation lithography tools available, offering unsurpassed throughput, precision, accuracy, and energy efficiency.
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