Used ASML PAS 5500 / 750E #293829886 for sale

ASML PAS 5500 / 750E is a wafer stepper that is used to give a high precision level of photolithography during the semiconductor production process. It has the capability to achieve a wide range of resolutions, making it a viable choice during different stages of the IC (integrated circuit) production. This stepper's feature is its ability to produce a 28nm line width and the smallest 0.1 micron resolution. PAS 5500 / 750E utilizes a dual-axis structure, based on the X and Y coordinates, in producing stepper patterns that are cut into the semiconductor surface. This equipment permits the use of a coating and layering process, making it possible for both the patterning and etching processes to take place in one single machine. Further advantages of ASML PAS 5500 / 750E include the ability to incrementally increase the resolution up to 0.1 micron and the fact that it can also accommodate micro-level wafer layout corrections and adjustments. PAS 5500 / 750E comprises of a 248nm I-Source, a laser optics alignment system, laser scanner components and a projection unit. The I-Source is a high-power laser that is suitable for both soft- and hard-contact modes of lithography. With the help of both illumination and scan mirrors of the laser scanner, wafer shots with high uniformity can be attained. These lasers scanners and mirrors form an integral part of the lithography process. The projection machine sends an imaging pattern straight to the wafer, where an individual exposure must take place for each shot. The tool allows for the interruption of an imaging job to add additional shots and for the number of shots to be changed as the layer placement changes. The same applies to both single and multi-level patterns, allowing for a compact lithography stack. ASML PAS 5500 / 750E is also equipped with a superior interferometer which assists in keeping the alignment of the mirrors in the laser scans. This ensures that the best possible imaging is accomplished, with the finest economic results. In addition, the asset is equipped with a high-performance motor model The response of the motor equipment can reach 0.2ms, allowing for highly accurate and complex patterns to be written into the wafer. The system also features a dual-mode stepper, meaning that either two-dimensional vision stitching or one-dimensional scan mode can be employed to quickly and accurately locate any errors or modifications in the pattern. All of these features combined make PAS 5500 / 750E a reliable and economical choice for high-precision photolithography.