Used ASML PAS 5500 / 750F #293817856 for sale

ASML PAS 5500 / 750F is a next-generation maskless lithography wafer stepper developed by ASML, a technology leader in the semiconductor manufacturing industry. It is a high-end, full-field, i-line immersion lithography equipment intended for production of IC patterns at the 45-nanometer and below nodes. PAS 5500 / 750F is built with a number of advanced features to ensure optimal performance. It features a 150 nanometer NA, an Ohara Fused Silica Coated Substrate (FSCS) for high-NA imaging performance, a 750 watts laser, and off-axis illumination for improved depth of focus (DOF). The high-NA and robust illumination assist with printing higher resolution and complex vias and holes in the same exposure. The system also features a zoom capability for creating multiple different field sizes to accommodate all mask sizes from 10mm x 10mm to 200mm x 200mm. ASML PAS 5500 / 750F is equipped with advanced imaging technology to ensure superior pattern placement accuracy and overlay performance. It is capable of achieving a maximum overlay accuracy of +/- 5 microns and a maximum placement accuracy of +/- 10 microns across the 200 mm wafer stage. It also features a high-speed raster scan mode, rotating image plane (RIP) technology, and a motion correction unit. These features allow the machine to quickly and accurately scan the mask features across the wafer. PAS 5500 / 750F is designed to reduce defects across the entire wafer. To help reduce substrate loading and unloading errors, it has a camera-based substrate alignment unit that allows precise alignment of the wafer to the axis. It also has an active alignment tool to help reduce defects from element deformation and misalignment. The wafer exposure optics are also built with features that reduce pattern shifts, further protecting the wafer against contamination. ASML PAS 5500 / 750F is capable of repeating features and features with complex geometries without sacrificing pattern fidelity and resolution. It also features a reliable and low-maintenance laser source, allowing for increased up-time with minimal maintenance. Additionally, its advanced image-processing suites can help identify any image distortion which is caused by aberration or vibration in the optical asset. In conclusion, PAS 5500 / 750F is an advanced lithography model that creates higher resolution patterns with superior placement accuracy, overlay performance, and pattern fidelity. It features a high-NA, zoom capabilities, various imaging technologies, and active alignment to help ensure optimal performance and reduce defects.