Used ASML PAS 5500 / 850D #293817847 for sale

ASML PAS 5500 / 850D
Manufacturer
ASML
Model
PAS 5500 / 850D
ID: 293817847
Stepper Numerical Aperture (NA): 0.55~0.80 DCO:  15 MMO: 25 Resolution: 110 nm Throughput (WPH): 145.
ASML PAS 5500 / 850D is a state-of-the-art wafer stepper designed for semiconductor device fabrication and lithographic processing. It features a dual-stage optics equipment with a large collection of optional optics configurations that enable a wide range of wafer imaging capability. The system uses advanced optical components that enable high accuracy and repeatability, including micro-lithography, and extreme ultraviolet (EUV) light exposure. The unit's design makes it one of the most efficient and powerful tools to perform lithography, making it an ideal solution for demanding semiconductor devices. The basic machine is composed of two stages: a scan stage where the mask is scanned to project the desired pattern and an exposure stage where the wafer is exposed to the UV light through the mask. The five-axis motion stage of the tool provides up to 1 micron of movement accuracy, allowing for precise beam alignment, even at the highest resolution levels. The asset utilizes several advanced features to improve image quality and reduce imaging time. It features an ultra high-resolution photodetector, which ensures accurate data collection and subsequent processing. It also has a robust EUV light source, capable of providing the correct energy for high aspect ratio (HAR) patterning and deep-UV imaging. A liquid-crystal display (LCD) projection model provides visual feedback to the operator, allowing for easy operation and adjustments to ensure accurate and repeatable results. The equipment uses automated material handling systems to manage the wafers and masks throughout the imaging processes. This includes integrated systems for wafer loading and unloading, as well as robots to transfer the samples and masks to the exposure stage. In addition, comprehensive software solutions are provided to control, manage and monitor the lineup, lens selection, patterning, exposure and other operational parameters. PAS 5500 / 850D is a versatile tool that can be used in many different applications, such as single mask imaging, dual mask imaging, short wafer challenges, pattern overlay and many more. The system is well suited for commercial, industrial and research settings, providing fast and accurate results to assist in complex lithography processes. Whether the goal is to produce high-performance chips, or to explore new lithographies capabilities, ASML PAS 5500 / 850D has the capability to deliver.
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