Used ASML PAS 5500 #293830305 for sale

ASML PAS 5500 is a step and scan lithographic wafer stepper. It uses laser light produced by the EUV-lithography process to expose an image of the wafer onto a photomask. The mask is then moved to expose different images onto the wafer. This process allows for the creation of complex and highly detailed microcircuits for a variety of applications. PAS 5500 is an all-in-one matrix navigator/polychromatic scanner/optical system, controlled by multiple computers. It contains eight lasers, each producing 30 W of power, allowing for precision exposure of pattern segments. The lithography mirrors can move on two axes (x and y) with nanometre accuracy. The wafer is held in place on an AlGaAs semiconducting stage at a pressure of 0.5 torr, allowing for uniform etching during the lithographic process. ASML PAS 5500 employs EUV-Lithography wavelength of 13.2 nanometers (nm) in order to accurately etch the pattern onto the wafer. EUV-Lithography is an extremely precise process, with a write field of only 5-15 nm, resulting in a minimum feature size of just 20 nm. PAS 5500 is capable of producing multiple patterns in one go, with minimal waste. It is also able to perform hyper-scaling lithography for areas with multiple features, and high resolution deposition for devices requiring finer etching. Additionally, it can perform multi-layer etching and nano-imprint lithography. ASML PAS 5500 has a modular design, allowing for customization and easy maintenance. The mask table is set at a 60 degree angle, reducing the time and complexity of swapping masks. This allows for quick changes during production, increasing productivity. PAS 5500 stepper is optimized for microelectronic manufacturing, and is a reliable and efficient way of producing complex circuits on wafers. Its small footprint and low power consumption make it suitable for use in a wide range of manufacturing environments.