Used ASML Twinscan 1700i #9408937 for sale

Manufacturer
ASML
Model
Twinscan 1700i
ID: 9408937
Vintage: 2009
Immersion scanner CIM: SECS Process: Backend 40/45 nm Argon fluoride laser: 193 nm 2009 vintage.
ASML Twinscan 1700i is one of the leading wafer steppers in the semiconductor industry. It is designed to provide efficient and accurate lithography scanning to create detailed circuit patterns and structures on substrates such as silicon wafers. Twinscan 1700i consists of a five axis stage, photolithography lens and projection equipment. The five axis stage is equipped with linear motors to provide ultra-precise and rapid positioning capabilities, allowing for faster cycle times. The lens is a high-accuracy and high-dispersion focusing system with a capacity of up to 1.2x magnification. The projection unit consists of an illumination source, optical elements and a projection lens, which together project full chip layout designs onto substrates. ASML Twinscan 1700i is also equipped with an advanced control machine. This tool has built-in features that make it suitable for a wide range of applications, including single layer and multi-layer designs. This includes optimization techniques for reduction of pixel defects, enhanced alignment accuracy and seamless edge sharpness. Twinscan 1700i also has a high-speed computation module and advanced tracking and overlay correction capabilities, which allows the asset to reduce cycle times while maintaining high image accuracy. ASML Twinscan 1700i has been designed to offer maximum flexibility in terms of dose and focus. The model can be easily configured to meet customer-specific requirements and it is also compatible with a variety of substrates. Twinscan 1700i has high uptime, low service requirements, and excellent reliability. It also offers comprehensive lithography solutions for both prototype and production lines and can be used for a variety of microelectronics applications.
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