Used ASML Twinscan AT 1100B #293652583 for sale
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ID: 293652583
Wafer Size: 8"-12"
Vintage: 2003
ArF Scanner, 8"-12"
193 nm
STARLITH 1100 Lens 4x
(2) Reticle SMIF pods, 6"
Throughput: >60 WPH
Scan field: 26 x 32 nm
Conventional illuminator: 0.85 - 0.33
DOE Turret illuminator with quasar
CYMER NANOLITH 7000 Series ArF laser, 20 W
SUN SPARC Remote workstation
Chemical extraction system
FSI / TEL / TOKYO ELECTRON Polaris 3500 Tracking interface
SECS I
SECS II
Annular
2003 vintage.
ASML Twinscan AT 1100B is a high-precision wafer stepper designed for next-generation semiconductor fabrication. It provides accurate, repeatable processing of single and large-area photomasks up to 180-millimeter (mm) in diameter, with advanced alignment and verification technologies to ensure yield and quality. This multi-beam machine is equipped with an advanced stage equipment and a state-of-the-art illumination system that allows maximum image resolution. The machine's high speed, accuracy, and repeatability make it ideal for production of wafers with advanced features. Twinscan AT 1100B features a single-scan architecture with a dynamic focus unit that ensures precise focus, and dynamic scan speed that maintains consistent scan speed across the entire chip. The machine is equipped with a powerful, robust mask transport tool for precise mask positioning and image alignment, and an integrated wafer stage for reliable wafer handling. In addition, the machine is equipped with optical pattern recognition and verification tools that provide feedback on performance and product data. ASML Twinscan AT 1100B has a low-magnification imaging asset that can be used to inspect and verify photomasks prior to production, while the high-resolution scanners ensure precise lithographic performance. The machine is also equipped with advanced lithographic monitoring and metrology systems to provide continuous monitoring throughout the process. The machine is capable of processing up to 180 wafers per hour and is prepared to handle a wide range of multiple photomasks through the use of advanced film-thickness measurement systems. In summary, Twinscan AT 1100B is a powerful, accurate, reliable, and robust wafer stepper that provides precise lithographic reproduction of photomasks. With its advanced stage model, innovative illumination equipment, and integrated wafer handling tools, ASML Twinscan AT 1100B is an excellent choice for fabricating complex ICs with exacting accuracy.
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