Used ASML Twinscan AT 1100B #293810555 for sale
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ID: 293810555
Wafer Size: 8"-12"
ArF Scanner, 8"-12"
193 nm
STARLITH 1100 Lens 4x
(2) Reticle SMIF pods, 6"
CYMER NANOLITH 7000 Series ArF laser, 20 W.
ASML Twinscan AT 1100B is a premier step-and-scan lithography equipment specifically designed for advanced semiconductor device production. This step-and-scan system is used to produce the most advanced components used in the electronics industry. The unit is designed to provide unparalleled precision and repeatability in the lithography process. Twinscan AT 1100B employs an improved wafer stage machine, with enhanced accuracy and precision that more efficiently utilizes its step-and-scan capability. This wafer stage tool is integrated with the asset's illuminator, which is a high power optical source, generating laser radiation using an argon fluoride laser. This laser radiation reaches the surface of a wafer, creating patterns for devices that can be as small as 65 nanometers. The lithography process is controlled through a series of sophisticated software algorithms, which includes a dynamic focus management model and a graphical user-interface. The dynamic focus management equipment ensures that the laser radiation remains in focus and that the patterned layers are accurately projected onto the wafer. The graphical user-interface allows the user to easily manipulate the lithography process to meet the needs of the device being produced. ASML Twinscan AT 1100B offers a number of advanced features that make it a powerful stepping solution. These features include an integrated measurement system, which allows the user to quickly and accurately measure the accuracy of the device being produced. Additionally, the unit is equipped with an advanced exposure control machine, which enables users to accurately control the microdose of radiation required to pattern the device. Twinscan AT 1100B is constructed with renowned precision, delivering high levels of performance. This tool is also incredibly versatile; it is capable of using different exposure techniques, pattern resizing, and exposure stitching to produce patterns with greater complexity and precision. This capability enhances the potential for high-performance production with minimal wastage. Overall, ASML Twinscan AT 1100B is a powerful, high-precision wafer stepper, ideal for advanced semiconductor device production. This asset provides unmatched accuracy and repeatability through its impressive step-and-scan lithography capability, sophisticated software, and an advanced exposure control model. Its versatile features and exceptional performance makes it a premier choice for any semiconductor production facility.
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