Used ASML Twinscan AT 1150 #9360853 for sale

ASML Twinscan AT 1150
Manufacturer
ASML
Model
Twinscan AT 1150
ID: 9360853
Scanner 193 nm.
ASML Twinscan AT 1150 is an advanced wafer stepper used in the semiconductor industry. It has a partitioned scanning equipment comprised of two parts- a primary scanning system for angular scanning in the x-y plane, and a secondary scanning unit for linear scanning along the z-axis. Twinscan AT 1150 utilizes a diffractive micro-optical element to improve the quality of the output image. It is equipped with a shielding machine to prevent damage to the optics during imaging. ASML Twinscan AT 1150 has a large field of view, with a maximum field size of 19 x 19 mils, and a maximum field deviation of 0.05 mils. It has a minimum feature size of 2.5 nm, with a minimum feature tolerance of 0.25nm. Thanks to its advanced micro-optical element, the stepper features an extremely high numerical aperture of 0.8, the widest available. In addition, its optical design allows for simultaneous high NA and low distortion imaging. Twinscan AT 1150 is designed with an impressive data throughput rate of up to 500 wafers per hour. It can also be operated in a variety of environments, from standard to vacuum. It is equipped with an articulated stage, allowing for high speed translations of up to 10 m/s, and features an integrated digital measuring tool for improved accuracy and precision. The stepper is equipped with several advanced illumination systems, with a wide range of options for power, wavelength, and intensity. Its advanced internal software enables advanced in-chamber image algorithmic processing and image-based decisions. It is also integrated with a global alignment asset to ensure the accuracy of measurements over a range of wafer specimens. ASML Twinscan AT 1150 is a highly advanced model designed to meet the demands of the ever-evolving semiconductor industry. With its large field of view, high numerical aperture, and fast data throughput rate, it is an ideal tool for image reduction and alignment processes. Its sophisticated illumination systems and image processing capability make it effectively suited for the exacting requirements of the manufacturing process.
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