Used ASML Twinscan AT 1150i #9112174 for sale

ASML Twinscan AT 1150i is a premier photolithography wafer stepper that is designed to perform high-precision lithography of integrated circuits (ICs), microelectromechanical systems (MEMS), and advanced optics. This automated scanner equipment provides customers with superior throughput, superb pattern fidelity, and expanded process latitude to help produce the most advanced technologies. Twinscan AT 1150i is the latest generation tool, featuring a new scanner design, in-situ calibration, and advanced metrology and process control capabilities. It integrates ASML dip-in photolithography system with a unique scanner unit design featuring a high-speed linear scan, a two-frame, single deflector, and a field lens that ensures great uniformity and efficiency. With the power and flexibility of ASML Twinscan AT 1150i, users can lithograph chips with feature sizes down to 20nm while achieving outstanding margin and overlay performance. Twinscan AT 1150i gives users the ability to lithograph highly demanding specular and non-specular layers with exceptional control and accuracy. The machine also utilizes a high-precision X-Y stage and scanner motion systems that enable high throughput and fast throughput. It also employs quadrant detectors to ensure unmatched level of image uniformity. In addition to superior lithography capabilities, ASML Twinscan AT 1150i also features a wide variety of advanced metrology and process control options. This includes an advanced reticle metrology tool, a multi-quadrant auto-scaling asset, depth-of-focus calculations, and active feedback for higher levels of lithography optimization. Additionally, Twinscan AT 1150i has an industry-leading inspection model which is used to validate the integrity of wafers before exposing them. Power and stability are two of the most important features of ASML Twinscan AT 1150i. This machine is powered by advanced wafer handling systems, encompassing multiple stages and robots, and a sealed scanner to ensure optimal working conditions regardless of ambient temperatures. It also features onboard wafer routing, overhead cold-process switching, and on-the-fly configuration changes, allowing for a continuous production process. Twinscan AT 1150i is the ideal tool for fine-pitch technologies and high-end 3D design. It combines superior lithography performance and advanced metrology and process control capabilities to ensure the highest quality device design. With its advanced light source and scanning technology, ASML Twinscan AT 1150i gives users the power to create the most capable devices available today.